A blue to red light sensitive photoinitiating systems based on 3,5-di-tert-butyl-o-benzoquinone derivatives for free radical polymerization

• Published in: European polymer journal 2020-03, Vol.127, p.109573, Article 109573
• Main Authors: Shurygina, Margarita P., Zakharina, Maria Yu, Baten'kin, Maxim A., Konev, Alexey N., Shavyrin, Andrey S., Chelnokov, Egor A., Shushunova, Nataliya Yu, Arsenyev, Maxim V., Chesnokov, Sergey A., Abakumov, Gleb A.
• Format: Article
• Language: English
• Subjects: Amine; Amines; Benzoquinone; Curing; Deep polymerization; Free radical polymerization; Free radicals; Frontal polymerization; Glycol dimethacrylates; LED; Light irradiation; Multicolor; O-quinone; Photocuring; Photoinitiating system; Photopolymerization; Photoreduction; Polymerization; Quinones; Radiation; Resins; Thickness; Triethylene glycol dimethacrylate; Visible light
• ISSN: 0014-3057; 1873-1945
• DOI: 10.1016/j.eurpolymj.2020.109573

[Display omitted] •New well-photobleachable initiating systems based on unsubstituted and four 6-CH2X-substituted 3,5-di-tert-butyl-o-benzoquinones and tertiary amines were used for deep (up to 46 cm) photocuring methacrylic resins under visible light irradiation. New well-photobleachable initiating systems based on unsubstituted and four 6-CH2X-substituted 3,5-di-tert-butyl-o-benzoquinones (X = H, OCH3, dimethylpyrazole and benzimidazole fragments) and tertiary amines were used for photocuring different methacrylic resins under visible light irradiation. A photoreduction of these o-quinones in the presence of a series of N,N-dimethylanilines under of visible irradiation was studied. Photoinitiating properties of this series of o-benzoquinones in the presence of N,N-dimethylaniline were investigated on the example of the curing resin based on triethylene glycol dimethacrylate (TEGDMA). The photoinitiation system based on o-quinone with dimethylpyrazole fragment and N,N-dimethylaniline has the highest efficiency in this series. It was shown that the use of this initiating system allows to photocure thick layers of TEGDMA/bis-GMA (30/70 wt%) resin (0.5 cm) under the action of both LEDs with λmax 465, 520 and 630 nm. A deep photopolymerization of the composition layer (46 cm thickness) under radiation of LED@600 nm (540 mW cm−2) was carried out. The average speed of the front of photopolymerization is 2.56 cm/min.