Hydrolytic, thermal, and UV stability of urea‐formaldehyde resin/thermally activated montmorillonite nanocomposites

Urea‐formaldehyde resin (F/U ratio of 0.8)/thermally activated montmorillonite (UF/ΔTK10) nanocomposite was synthesized. The hydrolytical, thermal, and UV radiation stability of UF/ΔTK10 nanocomposites are determined. UF hybrid nanocomposites have been irradiated with UV light with a wavelength of 2...

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Bibliographic Details
Published in:Polymer composites 2020-09, Vol.41 (9), p.3575-3584
Main Authors: Samaržija‐Jovanović, Suzana, Jovanović, Vojislav, Petković, Branka, Jovanović, Tijana, Marković, Gordana, Porobić, Slavica, Papan, Jelena, Marinović‐Cincović, Milena
Format: Article
Language:English
Subjects:
Acid resistance
Crosslinking
Differential thermal analysis
Differential thermogravimetric analysis
Formaldehyde resins
Gravimetric analysis
Infrared analysis
Irradiation
Montmorillonite
Nanocomposites
radiation
resins
Stability analysis
thermogravimetric analysis (TGA)
Ultraviolet radiation
Ureas
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Summary:Urea‐formaldehyde resin (F/U ratio of 0.8)/thermally activated montmorillonite (UF/ΔTK10) nanocomposite was synthesized. The hydrolytical, thermal, and UV radiation stability of UF/ΔTK10 nanocomposites are determined. UF hybrid nanocomposites have been irradiated with UV light with a wavelength of 254 nm and 366 nm, and after that, their radiation stability was evaluated. The free formaldehyde (FA) percentage in all prepared samples was determined. The sample was characterized by using X‐ray diffraction analysis (XRD), nonisothermal thermogravimetric analysis (TGA), differential thermal analysis (DTA), and differential thermal gravimetry (DTG), with infrared (FTIR) spectroscopy. Crosslinked UF/ΔTK10 nanocomposite shows the highest resistance to acid hydrolysis after UV irradiation at a wavelength of 254 nm. The values for T5% are identical for the unirradiated and UV irradiated (wavelength of 366 nm) UF/ΔTK10 nanocomposite. It can be concluded that this sample is thermally most stable and shows good resistance to UV irradiation.
ISSN:0272-8397
1548-0569
DOI:10.1002/pc.25644