Traceable Thickness Measurement of nm Oxide Films by Mutual Calibration

Mutual calibration has been known to be a traceable method to determine the absolute thickness of nm oxide films Recently, the thicknesses of a serious of ultra-thin HfO2 films were compared in a CCQM pilot study P-190 by 11 NMIs using various thickness measurement methods. The reference thicknesses...

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Bibliographic Details
Published in:Journal of Surface Analysis 2019, Vol.26(2), pp.152-153
Main Authors: Kim, Kyung Joong, Kim, Ansoon, Kwon, Jihwan, Kim, Chang Soo, Min, Won Ja
Format: Article
Language:English
Subjects:
Calibration
Casting
Hafnium oxide
Ion scattering
Ion scattering spectroscopy
Measurement methods
Oxide coatings
Photoelectrons
Reflectometry
Spectrum analysis
Thickness measurement
Thin films
X ray photoelectron spectroscopy
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Summary:Mutual calibration has been known to be a traceable method to determine the absolute thickness of nm oxide films Recently, the thicknesses of a serious of ultra-thin HfO2 films were compared in a CCQM pilot study P-190 by 11 NMIs using various thickness measurement methods. The reference thicknesses of the films were precisely determined by mutual calibration by the average thickness of x-ray photoelectron spectroscopy (XPS) and x-ray reflectometry (XRR) data. The film thicknesses were also measured by medium energy ion scattering spectroscopy (MEIS). The film thicknesses measured by MEIS were linearly proportional to the reference thicknesses and the thickness difference was about 2%.
ISSN:1341-1756
1347-8400
DOI:10.1384/jsa.26.152