Effect of post annealed treatment on HfN thin films prepared by DC reactive magnetron sputtering

Hafnium nitride (HfN) films were deposited on silicon (100) wafer substrate by dc reactive magnetron sputtering. The influences of annealed temperature on structural, morphological and optical property were systematically investigated. The grazing incident X-ray diffraction (GIXRD) results indicated...

Full description

Saved in:
Bibliographic Details
Main Authors: Phae-ngam, W., Prathumsit, J., Gitgeatpong, G., Chananonnawathorn, C., Lertvanithphol, T., Saekow, B., Nakajima, H., Horprathum, M.
Format: Conference Proceeding
Language:English
Subjects:
Annealing
Chemical composition
Electron microscopes
Field emission microscopy
Magnetron sputtering
Morphology
Optical properties
Photoelectrons
Silicon substrates
Thin films
X ray photoelectron spectroscopy
Citations: Items that cite this one
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Hafnium nitride (HfN) films were deposited on silicon (100) wafer substrate by dc reactive magnetron sputtering. The influences of annealed temperature on structural, morphological and optical property were systematically investigated. The grazing incident X-ray diffraction (GIXRD) results indicated that as-deposited and the annealed HfN thin films were cubic phase. The morphologies and optical property of the prepared samples were obtained by field emission scanning electron microscope (FE-SEM) and UV-Vis-NIR spectrophotometer. The results show that the annealed temperature was effect on the surface morphology. Additionally, the X-ray photoelectron spectroscopy (XPS) was characterized on the as-deposited and annealed sample in order to discuss the chemical compositions.
ISSN:0094-243X
1551-7616
DOI:10.1063/5.0023267