Characterization of electron beam deposited Al2O3MgO thin films

For designing precision optical devices, there is always a quest for new materials having superior optical, chemical, mechanical etc., properties. Al2O3MgO exhibits excellent mechanical, optical and chemical properties which make it a potential candidate to be used in developing optical coatings and...

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Bibliographic Details
Main Authors: Tokas, Raj B., Jena, Shuvendu, Thakur, Sudhakar
Format: Conference Proceeding
Language:English
Subjects:
Atomic force microscopy
Chemical properties
Coatings
Electron beams
Microscopes
Optical coatings
Optical properties
Thin films
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Summary:For designing precision optical devices, there is always a quest for new materials having superior optical, chemical, mechanical etc., properties. Al2O3MgO exhibits excellent mechanical, optical and chemical properties which make it a potential candidate to be used in developing optical coatings and devices. In present work, Al2O3MgO thin film has been deposited by electron beam evaporation. Its optical and morphological properties have been assessed by transmission and atomic force microscopy measurements aiming for designing and developing challenging optical coatings.
ISSN:0094-243X
1551-7616
DOI:10.1063/5.0017967