Aspiration-assisted fabrication of patterned quantum dot films for photo-emissive color conversion

The fabrication of patterned quantum dot (QD) films is of great importance for color displays based on photo-emissive color conversion. In this work, a novel and precise alignment-free fabrication method of patterned quantum dot color conversion (QDCC) films was proposed by introducing into aspirati...

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Bibliographic Details
Published in:Journal of materials science 2021, Vol.56 (2), p.1504-1514
Main Authors: Weng, Yalian, Lai, Xiaocong, Chen, Guixiong, Zhou, Xiongtu, Yan, Qun, Wu, Chaoxing, Guo, Tailiang, Sun, Jie, Zhang, Yongai
Format: Article
Language:English
Subjects:
Characterization and Evaluation of Materials
Chemistry and Materials Science
Classical Mechanics
Color
Crystallography and Scattering Methods
Electronic Materials
Integrated circuit fabrication
Light-emitting diodes
Materials Science
Microchannels
Polymer Sciences
Polymers
Quantum dots
Solid Mechanics
Substrates
Toluene
Ultrafines
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Summary:The fabrication of patterned quantum dot (QD) films is of great importance for color displays based on photo-emissive color conversion. In this work, a novel and precise alignment-free fabrication method of patterned quantum dot color conversion (QDCC) films was proposed by introducing into aspiration-assisted lithography. QDs dispersed in mixed polymer/toluene solvent can be imbibed via predetermined micro-channels with the assist of aspiration. The results show that uniform QDCC films with multicolor QDs could be achieved by adjusting the polymer/toluene ratios and the aspiration time. Superfine QD patterns with a width of around 8 μm could also be obtained by varying the interfacial free energies of substrates. A color conversion device using a turquoise OLED and the QDCC films incorporated with distributed Bragg reflector have been demonstrated, exhibiting a conversion efficiency up to 23.27%.
ISSN:0022-2461
1573-4803
DOI:10.1007/s10853-020-05369-w