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Boron carbide thin films deposited by RF-PECVD and PLD technique: A comparative study based on structure, optical properties, and residual stress

Radio-Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD), and Pulsed Laser Deposition (PLD) techniques were used to deposit boron carbide (BxC) thin films. Films were investigated to compare crystallinity, chemical composition, optical properties, and residual stress. X-ray diffraction...

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Published in:Materials chemistry and physics 2021-01, Vol.258, p.123860, Article 123860
Main Authors: Bute, A., Jena, S., Kedia, S., Udupa, D.V., Singh, K., Bhattacharya, D., Modi, M.H., Chand, N., Sinha, S.
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cited_by cdi_FETCH-LOGICAL-c415t-d44ff6cbc04e59d456686ae43cfead3ed1f8a4abc783a5053897150c2a4653c63
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container_start_page 123860
container_title Materials chemistry and physics
container_volume 258
creator Bute, A.
Jena, S.
Kedia, S.
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Sinha, S.
description Radio-Frequency Plasma Enhanced Chemical Vapour Deposition (RF-PECVD), and Pulsed Laser Deposition (PLD) techniques were used to deposit boron carbide (BxC) thin films. Films were investigated to compare crystallinity, chemical composition, optical properties, and residual stress. X-ray diffraction analysis revealed that the film deposited by PLD was amorphous, while PECVD technique yielded crystalline BxC film. PLD technique provided films with better stoichiometric purity with B4C being the most dominant phase, as observed in XPS spectra. However, super-stoichiometric phase (BxC (x > 4)) was dominant in PECVD film. Moreover, the PECVD film had greater adhesion (Lc3 ~29.5 N), hardness (~2798 HK), and lubricity (COF~ 0.03) compared to PLD deposited film. Optically, PECVD deposited film have higher value of refractive indices (1.82 at 600 nm) and lower extinction coefficient. Finally, residual stress measured via substrate curvature method revealed that for PLD 400 C film, the stress was compressive in nature while the same for PECVD -100 V film was tensile, with 10 times less in magnitude. Ultimately, this study provides the user with opportunity to weigh the advantages and disadvantages of PECVD and PLD techniques for deposition of functional BxC films. [Display omitted] •Comparative study of BxC thin films deposited by PECVD and PLD techniques.•PECVD yielded crystalline, super-hard BxC films, at a high deposition rate.•PLD was found to be useful for near-stoichiometric BxC thin film deposition.•PECVD films have higher refractive index and low absorption in comparison.•Residual stress found to be dependent on deposition rate and energy of adatoms.
doi_str_mv 10.1016/j.matchemphys.2020.123860
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subjects Boron carbide
Chemical composition
Comparative studies
Compressive properties
Crystal structure
Crystallinity
Lubricity
Optical properties
PECVD
Plasma enhanced chemical vapor deposition
PLD
Pulsed laser deposition
Pulsed lasers
Radio frequency plasma
Refractivity
Residual stress
Residual stress calculation
Substrates
Thin films
X ray photoelectron spectroscopy
XPS
title Boron carbide thin films deposited by RF-PECVD and PLD technique: A comparative study based on structure, optical properties, and residual stress
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