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40 nm 1T-1MTJ 128 Mb STT-MRAM With Novel Averaged Reference Voltage Generator Based on Detailed Analysis of Scaled-Down Memory Cell Array Design
The development of STT-MRAM technology is currently in progress and has been successively disclosed by major LSI vendors recently. In order to advance STT-MRAM technology and expand its areas of application, challenges relative to further device scaling need to be addressed. In this study, an increa...
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Published in: | IEEE transactions on magnetics 2021-03, Vol.57 (3), p.1-9 |
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Main Authors: | , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The development of STT-MRAM technology is currently in progress and has been successively disclosed by major LSI vendors recently. In order to advance STT-MRAM technology and expand its areas of application, challenges relative to further device scaling need to be addressed. In this study, an increased wiring resistance in a deep sub-100 nm process by which the read operation yield is degraded was analyzed. The yield degradation was quantified by analyzing the conventional cell array using Monte-Carlo SPICE simulations. A new circuit was proposed to decrease the fail bit rate by an averaged reference voltage ( V_{\mathrm {ref}} ) generator. The simulated results indicated that the new V_{\mathrm {ref}} generator improved the fail bit rate by 1 order of magnitude compared to the conventional array. To demonstrate the circuit operation, a 128 Mb STT-MRAM chip was designed and fabricated using 40 nm CMOS and 37 nm MTJ technologies. For the first time, the chip measurements successfully demonstrated the operation of the proposed device-variation tolerant array architecture with the averaged V_{\mathrm {ref}} generator, presenting a 30 ns read access time. |
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ISSN: | 0018-9464 1941-0069 |
DOI: | 10.1109/TMAG.2020.3038110 |