A 5800 μm² Process Monitor Circuit for Measurement of in-Die Variation of Vth in 65nm

A compact 5800 μm 2 process monitor circuit is demonstrated which can measure multiple threshold voltages (Vth) locally on a die. An accurate, process/voltage/temperatureindependent current source is provided to measure Vth using the constant current method to an accuracy of σ = 3.6 mV. The output i...

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Bibliographic Details
Published in:IEEE transactions on circuits and systems. II, Express briefs Express briefs, 2021-03, Vol.68 (3), p.863-867
Main Authors: Lisha, Liron, Bass, Ori, Shor, Joseph
Format: Article
Language:English
Subjects:
Current measurement
Current sources
Integrated circuits
Monitoring
MOS devices
process monitor
Process parameters
Semiconductor device measurement
Sensors
sigma delta
Sigma-delta modulation
switched capacitor circuits
Temperature measurement
Temperature sensors
Threshold voltage
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Summary:A compact 5800 μm 2 process monitor circuit is demonstrated which can measure multiple threshold voltages (Vth) locally on a die. An accurate, process/voltage/temperatureindependent current source is provided to measure Vth using the constant current method to an accuracy of σ = 3.6 mV. The output is digitized by a sigma-delta modulator with a conversion time of 2ms. The circuit enables efficient and compact in-die variation monitoring of the key process parameters and is thus useful for the high-volume characterization of integrated circuit products. The circuit contains its own reference voltage, and thus can be used for calibration during testing or in the field.
ISSN:1549-7747
1558-3791
DOI:10.1109/TCSII.2020.3020945