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Selection Methodology for Si Power MOSFETs Used to Enhance SiC Power MOSFET Short-Circuit Capability With the BaSIC(EMM) Topology
The BaSIC(EMM) topology has been previously demonstrated to improve the short-circuit (SC) capability of 1.2-kV SiC power MOSFET s from 3.5 to 7.4 μs while producing a 17% increase in the net on -state resistance. However, a SC time of 10 μs could not be achieved. In this article, a systematic proce...
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Published in: | IEEE transactions on power electronics 2021-07, Vol.36 (7), p.8243-8252 |
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description | The BaSIC(EMM) topology has been previously demonstrated to improve the short-circuit (SC) capability of 1.2-kV SiC power MOSFET s from 3.5 to 7.4 μs while producing a 17% increase in the net on -state resistance. However, a SC time of 10 μs could not be achieved. In this article, a systematic procedure for selection of the Si power MOSFET used in the BaSIC(EMM) topology is described based on information published by manufacturers of Si power MOSFET s in their datasheets. A tradeoff curve between the Si EMM drain saturation current at 150 °C versus its on -resistance at 25 °C is proposed in this article for determination of the best Si EMM product. The proposed methodology allowed identification of a superior Si EMM device. It was experimentally validated that a SC with-stand time of 11 μs, under a gate bias of 20 V applied to the 1.2-kV SiC power MOSFET at a drain bias of 800 V, was achievable with an increase in on -resistance of only 3.6%. These experimental results demonstrate a greatly improved tradeoff curve between SC time and increase in on -resistance. |
doi_str_mv | 10.1109/TPEL.2020.3043281 |
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It was experimentally validated that a SC with-stand time of 11 μs, under a gate bias of 20 V applied to the 1.2-kV SiC power MOSFET at a drain bias of 800 V, was achievable with an increase in on -resistance of only 3.6%. These experimental results demonstrate a greatly improved tradeoff curve between SC time and increase in on -resistance.</description><identifier>ISSN: 0885-8993</identifier><identifier>EISSN: 1941-0107</identifier><identifier>DOI: 10.1109/TPEL.2020.3043281</identifier><identifier>CODEN: ITPEE8</identifier><language>eng</language><publisher>New York: IEEE</publisher><subject>BaSIC ; Bias ; EMM ; Inverters ; Logic gates ; MOSFET ; MOSFETs ; power MOSFETs ; Resistance ; short circuit capability ; Short circuits ; Silicon ; Silicon carbide ; Topology ; Tradeoffs</subject><ispartof>IEEE transactions on power electronics, 2021-07, Vol.36 (7), p.8243-8252</ispartof><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. 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Jayant</creatorcontrib><title>Selection Methodology for Si Power MOSFETs Used to Enhance SiC Power MOSFET Short-Circuit Capability With the BaSIC(EMM) Topology</title><title>IEEE transactions on power electronics</title><addtitle>TPEL</addtitle><description>The BaSIC(EMM) topology has been previously demonstrated to improve the short-circuit (SC) capability of 1.2-kV SiC power MOSFET s from 3.5 to 7.4 μs while producing a 17% increase in the net on -state resistance. However, a SC time of 10 μs could not be achieved. In this article, a systematic procedure for selection of the Si power MOSFET used in the BaSIC(EMM) topology is described based on information published by manufacturers of Si power MOSFET s in their datasheets. A tradeoff curve between the Si EMM drain saturation current at 150 °C versus its on -resistance at 25 °C is proposed in this article for determination of the best Si EMM product. The proposed methodology allowed identification of a superior Si EMM device. It was experimentally validated that a SC with-stand time of 11 μs, under a gate bias of 20 V applied to the 1.2-kV SiC power MOSFET at a drain bias of 800 V, was achievable with an increase in on -resistance of only 3.6%. These experimental results demonstrate a greatly improved tradeoff curve between SC time and increase in on -resistance.</description><subject>BaSIC</subject><subject>Bias</subject><subject>EMM</subject><subject>Inverters</subject><subject>Logic gates</subject><subject>MOSFET</subject><subject>MOSFETs</subject><subject>power MOSFETs</subject><subject>Resistance</subject><subject>short circuit capability</subject><subject>Short circuits</subject><subject>Silicon</subject><subject>Silicon carbide</subject><subject>Topology</subject><subject>Tradeoffs</subject><issn>0885-8993</issn><issn>1941-0107</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNpVkE9LwzAchoMoOKcfQLwEvOihM__aJkctVQcbG3TDY0na32zGXGaaITv6ze3cEDy9l-d9X3gQuqZkQClRD7NpPhowwsiAE8GZpCeoR5WgEaEkPUU9ImUcSaX4Obpo2yUhVMSE9tB3ASuognVrPIbQuNqt3PsOL5zHhcVT9wUejyfFcz5r8byFGgeH83Wj1xV0QPaPwEXjfIgy66utDTjTG23syoYdfrOhwaEB_KSLYXaXj8f3eOY2v1-X6GyhVy1cHbOP5t1W9hqNJi_D7HEUVUzxEBnQqaTAU8rrhKmKcUNVTAkzRpBEc7agWjCt6jSRxJiKp7UBkwCTJq4gFryPbg-7G-8-t9CGcum2ft1dlkwoKVNOZNxR9EBV3rWth0W58fZD-11JSbk3Xe5Nl3vT5dF017k5dCwA_PGKySQWgv8AZhR4eg</recordid><startdate>20210701</startdate><enddate>20210701</enddate><creator>Kanale, Ajit</creator><creator>Baliga, B. Jayant</creator><general>IEEE</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope><scope>JQ2</scope><scope>KR7</scope><scope>L7M</scope><orcidid>https://orcid.org/0000-0003-2274-3617</orcidid><orcidid>https://orcid.org/0000-0001-9171-0080</orcidid></search><sort><creationdate>20210701</creationdate><title>Selection Methodology for Si Power MOSFETs Used to Enhance SiC Power MOSFET Short-Circuit Capability With the BaSIC(EMM) Topology</title><author>Kanale, Ajit ; Baliga, B. Jayant</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c293t-bea781e3713d629c23b195102bb406a32f1a42a9d7680bbc37dbeb6e28b5ce543</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>BaSIC</topic><topic>Bias</topic><topic>EMM</topic><topic>Inverters</topic><topic>Logic gates</topic><topic>MOSFET</topic><topic>MOSFETs</topic><topic>power MOSFETs</topic><topic>Resistance</topic><topic>short circuit capability</topic><topic>Short circuits</topic><topic>Silicon</topic><topic>Silicon carbide</topic><topic>Topology</topic><topic>Tradeoffs</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kanale, Ajit</creatorcontrib><creatorcontrib>Baliga, B. Jayant</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE transactions on power electronics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kanale, Ajit</au><au>Baliga, B. Jayant</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Selection Methodology for Si Power MOSFETs Used to Enhance SiC Power MOSFET Short-Circuit Capability With the BaSIC(EMM) Topology</atitle><jtitle>IEEE transactions on power electronics</jtitle><stitle>TPEL</stitle><date>2021-07-01</date><risdate>2021</risdate><volume>36</volume><issue>7</issue><spage>8243</spage><epage>8252</epage><pages>8243-8252</pages><issn>0885-8993</issn><eissn>1941-0107</eissn><coden>ITPEE8</coden><abstract>The BaSIC(EMM) topology has been previously demonstrated to improve the short-circuit (SC) capability of 1.2-kV SiC power MOSFET s from 3.5 to 7.4 μs while producing a 17% increase in the net on -state resistance. However, a SC time of 10 μs could not be achieved. In this article, a systematic procedure for selection of the Si power MOSFET used in the BaSIC(EMM) topology is described based on information published by manufacturers of Si power MOSFET s in their datasheets. A tradeoff curve between the Si EMM drain saturation current at 150 °C versus its on -resistance at 25 °C is proposed in this article for determination of the best Si EMM product. The proposed methodology allowed identification of a superior Si EMM device. It was experimentally validated that a SC with-stand time of 11 μs, under a gate bias of 20 V applied to the 1.2-kV SiC power MOSFET at a drain bias of 800 V, was achievable with an increase in on -resistance of only 3.6%. These experimental results demonstrate a greatly improved tradeoff curve between SC time and increase in on -resistance.</abstract><cop>New York</cop><pub>IEEE</pub><doi>10.1109/TPEL.2020.3043281</doi><tpages>10</tpages><orcidid>https://orcid.org/0000-0003-2274-3617</orcidid><orcidid>https://orcid.org/0000-0001-9171-0080</orcidid></addata></record> |
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subjects | BaSIC Bias EMM Inverters Logic gates MOSFET MOSFETs power MOSFETs Resistance short circuit capability Short circuits Silicon Silicon carbide Topology Tradeoffs |
title | Selection Methodology for Si Power MOSFETs Used to Enhance SiC Power MOSFET Short-Circuit Capability With the BaSIC(EMM) Topology |
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