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Effects of high-temperature thermal annealing on GeSn thin-film material and photodetector operating at 2 µm
•Ordered nanopatterns are formed on the surface of GeSn from high-temperature annealing (~700 °C).•Structural and optical properties of GeSn films before and after rapid thermal annealing are reported.•An increased photocurrent (>200%) is observed for the GeSn photodetector at an annealing temper...
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Published in: | Journal of alloys and compounds 2021-08, Vol.872, p.159696, Article 159696 |
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Main Authors: | , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | •Ordered nanopatterns are formed on the surface of GeSn from high-temperature annealing (~700 °C).•Structural and optical properties of GeSn films before and after rapid thermal annealing are reported.•An increased photocurrent (>200%) is observed for the GeSn photodetector at an annealing temperature of 550 °C at 2-µm wavelength.
Here, we explore the thermal stability of GeSn epilayers with varying Sn contents (3–10%) at an annealing temperature ranging from 300° to 750°C. It is found that ordered nanopatterns are formed on the surface of GeSn with Sn content of 8% without excessive Sn precipitation after thermal annealing at 700 °C. Despite being annealed at high temperatures, the GeSn maintains its crystal structure, which is confirmed by the X-ray Diffraction (XRD), Raman spectrum, and secondary-ion mass spectrometry (SIMS). The corresponding photocurrents of the photodetectors at the wavelength of 2 µm also indicate the crystal quality of the GeSn alloys does not deteriorate significantly after high-temperature annealing (675–700 °C). Meanwhile, the decrease of dark current with the enhancement of Ip/Id ratio (on-off ratio) indicates the improvement of detectivity of the photodetector due to the annealing process. Furthermore, the annealing temperature is optimized to 550 °C to achieve 200% enhancement of photocurrents of the GeSn photodetectors operated at 2 µm. |
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ISSN: | 0925-8388 1873-4669 |
DOI: | 10.1016/j.jallcom.2021.159696 |