9‐3: Performance of New Gen. 6 Exposure Tools for 1.2 μm Resolution

We have developed new Gen. 6 exposure tools “MPAsp‐E903T” for 1.2 μm L&S and 1.8 μm hole patterning. Results of various performance tests show that the new tool meets all requirements for stable mass production of high quality display panels. Even higher resolution can be obtained with new techn...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2021-05, Vol.52 (1), p.99-102
Main Authors: Yabu, Nobuhiko, Hakko, Manabu, Okubo, Toru, Oyanagi, Takeo, Ando, Miwako, Terashi, Takaaki, Izumi, Nozomu, Osaki, Yoshinori
Format: Article
Language:English
Subjects:
1.2 μm
DSI
DUV
Exposure tools
Lithography
Mass production
Performance tests
PSM
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Summary:We have developed new Gen. 6 exposure tools “MPAsp‐E903T” for 1.2 μm L&S and 1.8 μm hole patterning. Results of various performance tests show that the new tool meets all requirements for stable mass production of high quality display panels. Even higher resolution can be obtained with new techniques.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.14620