Features of magnetron sputtering of a doubled Ta/Ti target

In this work, investigation of magnetron sputtering process of the doubled Ta/Ti target is presented. Such a construction allows to simultaneously sputter two materials, forming complex film structures on a substrate. The results of computer simulation and experimental investigation of the thermal b...

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2018-07, Vol.387 (1), p.12038
Main Authors: Komlev, A E, Shutova, E S, Komlev, A A
Format: Article
Language:English
Subjects:
Computer simulation
Magnetron sputtering
Substrates
Thermodynamic properties
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Summary:In this work, investigation of magnetron sputtering process of the doubled Ta/Ti target is presented. Such a construction allows to simultaneously sputter two materials, forming complex film structures on a substrate. The results of computer simulation and experimental investigation of the thermal behavior of the target, current-voltage and spectral characteristics of discharges, and characterization of the fabricated coating samples are given.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/387/1/012038