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Groundwater study in Subang Industrial park and its recharge area as a suggestion for establishing recharge and discharge zones of Subang Groundwater Basin

This research was conducted in Subang Groundwater Basin, West-Java, related to the prohibition of groundwater extraction in the Subang Industrial Park (SIP) area. This is because the area is considered as the Recharge Zone of the groundwater basin. The purpose of this study is to determine whether S...

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2020-04, Vol.830 (4), p.42045
Main Authors: Ashari, Y, Pulungan, L, Wijaksana, I K, Isniarno, N F, Mildan, D
Format: Article
Language:English
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Summary:This research was conducted in Subang Groundwater Basin, West-Java, related to the prohibition of groundwater extraction in the Subang Industrial Park (SIP) area. This is because the area is considered as the Recharge Zone of the groundwater basin. The purpose of this study is to determine whether SIP stands above the Recharge Zone or not, moreover, find out which part of the Basin that supplies groundwater aquifers of SIP. The method used in this study is applied of DRASTIC method using ArcGIS and conducting field research measuring the infiltration rate of soil formations at selected points in the Basin, geologic and hydrogeological mapping of Lakes. The results of this study indicate that the SIP is indeed built on a recharge area, the soil where the SIP is established, has ability to infiltrate rainwater. However, the results of more detailed observations of wellbore logs in this area, it is known that between the groundwater aquifer used in SIP and the infiltration zone of the ground surface is separated by impermeable clay layers. This ensures that there is no relationship between surface water infiltration and groundwater being extracted by factories in the areas. Therefore, it is certain that the recharge area originates from other areas in the Basin. Key words: aquifer, recharge area, Subang Groundwater Basin.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/830/4/042045