ProTEK PSB as Biotechnology Photosensitive Protection Mask on 3C-SiC-on-Si in MEMS Sensor

• Published in: IOP conference series. Materials Science and Engineering 2016-11, Vol.160 (1), p.12093
• Main Authors: Marsi, N, Majlis, B Y, Mohd-Yasin, F, Hamzah, A A, Rus, A Z Mohd
• Format: Article
• Language: English
• Subjects: Biotechnology; Coating effects; Microelectromechanical systems; Photosensitivity; Pressure effects; Production costs; Silicon carbide; Silicon nitride; Silicon wafers; Thickness; Thin films
• ISSN: 1757-8981; 1757-899X
• DOI: 10.1088/1757-899X/160/1/012093

This project presents the fabrication of MEMS employing a cubic silicon carbide (3C- SiC) on silicon wafer using newly developed ProTEK PSB as biotechnology photosensitive protection mask. This new biotechnology can reduce the number of processes and simplify the process flow with minimal impact on overall undercut performance. The 680 pm thick wafer is back-etched, leaving the 3C-SiC thin film with a thickness of 1.0 μm as the flexible diaphragm to detect pressure. The effect of the new coating of ProTEK PSB on different KOH solvents were investigated depending on various factors such as development time, final cure temperature and the thickness of the ProTEK PSB deposited layer. It is found that 6.174 μm thickness of ProTEK PSB offers some possibility of reducing the processing time compared to silicon nitride etch masks in KOH (55%wt, 80°C). The new ProTEK PSB biotechnology photosensitive protection mask indicates good stability and sustains its performance in different treatments under KOH and IPA for 8 hours. This work also revealed that the fabrication of MEMS sensors using the new biotechnology photosensitive protection mask provides a simple assembly approach and reduces manufacturing costs. The MEMS sensor can operate up to 500 °C as indicated under the sensitivity of 0.826 pF/MPa with nonlinearity and hysteresis of 0.61% and 3.13%, respectively.