Combined EPMA, FIB and Monte Carlo simulation: a versatile tool for quantitative analysis of multilayered structures

Electron probe microanalysis and focussed ion beam milling are combined to improve the sensitivity and applicability of depth profiling quantification. With the nanoscale milling capabilities of the ion beam, very shallow bevels are milled by using a special preparation procedure to reduce any curta...

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Bibliographic Details
Published in:IOP conference series. Materials Science and Engineering 2016-02, Vol.109 (1), p.12014-12026
Main Authors: Richter, S, Pinard, P T
Format: Article
Language:English
Subjects:
Algorithms
Bevels
Computer simulation
Depth profiling
Electron beams
Electron probe microanalysis
Electron probes
Electrons
Emission analysis
Genetic algorithms
Ion beams
Ion implantation
Monte Carlo methods
Monte Carlo simulation
Nanostructure
Quantitative analysis
Thickness
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Summary:Electron probe microanalysis and focussed ion beam milling are combined to improve the sensitivity and applicability of depth profiling quantification. With the nanoscale milling capabilities of the ion beam, very shallow bevels are milled by using a special preparation procedure to reduce any curtaining effect and minimize Ga ions implantation. A Ni Cr multilayered specimen is used to evaluate the depth resolution. The best results are obtained by a well-focussed electron beam offered by a field-emission microprobe. A new evaluation algorithm is presented to quantify the structure in terms of mass thicknesses or if the density is known in terms of real thicknesses. The quantification procedure is based on Monte Carlo simulations where calculated k-ratios (calibrated X-ray intensities) are compared to the experimental ones to find the optimal structure. In comparison with an ion milled cross-section, the proposed bevel technique is more sensitive and provides more information about the material's structure.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/109/1/012014