Improved tribological behavior of plasma-nitrided AlCrTiV and AlCrTiVSi high-entropy alloy films

• Published in: Tribology international 2021-11, Vol.163, p.107195, Article 107195
• Main Authors: Cai, Zhaobing, Wang, Zheng, Hong, Yue, Lu, Bingwen, Liu, Jin, Li, Yang, Pu, Jibin
• Format: Article
• Language: English
• Subjects: Aluminum oxide; Coefficient of friction; DC magnetron sputtering; High entropy alloys; High-entropy alloy films; Ion nitriding; Lattice parameters; Mechanical properties; Nanohardness; Plasma; Plasma nitriding; Solid solutions; Tribological behavior; Tribology; Wear rate; Wear resistance
• ISSN: 0301-679X; 1879-2464
• DOI: 10.1016/j.triboint.2021.107195

Plasma nitriding was used to improve the tribological properties of AlCrTiV and AlCrTiVSi high-entropy alloy (HEA) films. The results indicated that after plasma nitriding, the microstructure and tribological property were improved greatly. For plasma-nitrided AlCrTiV, it is still composed of a single BCC solid solution but with a decreased lattice constant, while for plasma-nitrided AlCrTiVSi, a new V4.75Si3N0.58 nitride phase forms in the amorphous matrix, which all lead to the increase of nano-hardness, promoting the reduction of wear degree or wear rate against GCr15 and Al2O3. Due to the perfect balance of hardness and toughness, the plasma-nitrided AlCrTiV HEA film has the lowest friction coefficient (against Al2O3) and the best wear-resistance. •Plasma nitriding was used to improve the microstructure of AlCrTiV and AlCrTiVSi HEA films.•N atoms are solidly dissolved to the BCC solid solution of AlCrTiV.•N atoms mainly react with metal elements in AlCrTiVSi to form V4.75Si3N0.58 phase.•Plasma nitriding leads to increased nano-hardness and improved tribological property.•Plasma-nitrided AlCrTiV HEA film has the lowest friction coefficient and the best wear-resistance.