Loading…
In situ reflection electron microscopy for investigation of surface processes on Bi2Se3(0001)
The sublimation and van der Waals (vdW) epitaxy on Bi 2 Se 3 (0001) surface have been first visualized using in situ reflection electron microscopy. When Bi 2 Se 3 (0001) surface was exposed to a Se molecular beam (up to 0.1 nm/s) and heated to ∼400°C, we observed ascending motion of atomic steps co...
Saved in:
Published in: | Journal of physics. Conference series 2021-07, Vol.1984 (1), p.12016 |
---|---|
Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43 |
---|---|
cites | cdi_FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43 |
container_end_page | |
container_issue | 1 |
container_start_page | 12016 |
container_title | Journal of physics. Conference series |
container_volume | 1984 |
creator | Ponomarev, S A Rogilo, D I Kurus, N N Basalaeva, L S Kokh, K A Milekhin, A G Sheglov, D V Latyshev, A V |
description | The sublimation and van der Waals (vdW) epitaxy on Bi
2
Se
3
(0001) surface have been first visualized using
in situ
reflection electron microscopy. When Bi
2
Se
3
(0001) surface was exposed to a Se molecular beam (up to 0.1 nm/s) and heated to ∼400°C, we observed ascending motion of atomic steps corresponding to congruent Bi
2
Se
3
sublimation. During the sublimation, grooves made by probe lithography act as sources of atomic steps: groove depth increases and generates atomic steps that move in the ascending direction away from the source. We used this phenomenon to create self-organized regularly-spaced zigzag atomic steps having 1 nm height on the Bi
2
Se
3
(0001) surface. The deposition of Bi (up to ∼0.01 nm/s) onto the Bi
2
Se
3
(0001) surface at constant Se flux (up to ∼0.1 nm/s) reversed the direction of the step flow, and vdW epitaxy was observed. The deposition of In and Se onto the Bi
2
Se
3
(0001) surface at ∼400°C led to the epitaxial growth of layered In
2
Se
3
. This vdW heteroepitaxy started with 2D island nucleation and, after 3–5 nm growth, continued with a screw-dislocation-driven formation of 3D islands.
Ex situ
Raman scattering measurements have shown that the grown 20-nm-thick In
2
Se
3
film exhibits vibrational modes that originate from the β-In
2
Se
3
crystal phase. |
doi_str_mv | 10.1088/1742-6596/1984/1/012016 |
format | article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2572261618</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2572261618</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43</originalsourceid><addsrcrecordid>eNqFUF1LwzAULaLgnP4GA76oUHuTtGn6qMNPBgrTRwlpmkjGttRkFfbvTa1MBMH7cg_JOefee5LkGMMFBs4zXOYkZUXFMlzxPMMZYAKY7SSj7c_uFnO-nxyEMAegscpR8nq_QsGuO-S1WWi1tm6FdA98BEurvAvKtRtknEd29aHD2r7JL5YzKHTeSKVR653SIeiA4vuVJTNNTwEAnx0me0Yugj767uPk5eb6eXKXTh9v7yeX01RRwllKc0mKErQhhDQ4wloD1A2mFVUUZK1KMCBlxTQH3dRcSSxlUSpFWVXUOqfj5GTwjZu8d3FJMXedX8WRIroRwjDDPLLKgdVfFeLBovV2Kf1GYBB9lqJPSfSJiT5LgcWQZVTSQWld-2P9v-r8D9XD02T2myjaxtBPqPGDQA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2572261618</pqid></control><display><type>article</type><title>In situ reflection electron microscopy for investigation of surface processes on Bi2Se3(0001)</title><source>Publicly Available Content Database</source><source>Full-Text Journals in Chemistry (Open access)</source><creator>Ponomarev, S A ; Rogilo, D I ; Kurus, N N ; Basalaeva, L S ; Kokh, K A ; Milekhin, A G ; Sheglov, D V ; Latyshev, A V</creator><creatorcontrib>Ponomarev, S A ; Rogilo, D I ; Kurus, N N ; Basalaeva, L S ; Kokh, K A ; Milekhin, A G ; Sheglov, D V ; Latyshev, A V</creatorcontrib><description>The sublimation and van der Waals (vdW) epitaxy on Bi
2
Se
3
(0001) surface have been first visualized using
in situ
reflection electron microscopy. When Bi
2
Se
3
(0001) surface was exposed to a Se molecular beam (up to 0.1 nm/s) and heated to ∼400°C, we observed ascending motion of atomic steps corresponding to congruent Bi
2
Se
3
sublimation. During the sublimation, grooves made by probe lithography act as sources of atomic steps: groove depth increases and generates atomic steps that move in the ascending direction away from the source. We used this phenomenon to create self-organized regularly-spaced zigzag atomic steps having 1 nm height on the Bi
2
Se
3
(0001) surface. The deposition of Bi (up to ∼0.01 nm/s) onto the Bi
2
Se
3
(0001) surface at constant Se flux (up to ∼0.1 nm/s) reversed the direction of the step flow, and vdW epitaxy was observed. The deposition of In and Se onto the Bi
2
Se
3
(0001) surface at ∼400°C led to the epitaxial growth of layered In
2
Se
3
. This vdW heteroepitaxy started with 2D island nucleation and, after 3–5 nm growth, continued with a screw-dislocation-driven formation of 3D islands.
Ex situ
Raman scattering measurements have shown that the grown 20-nm-thick In
2
Se
3
film exhibits vibrational modes that originate from the β-In
2
Se
3
crystal phase.</description><identifier>ISSN: 1742-6588</identifier><identifier>EISSN: 1742-6596</identifier><identifier>DOI: 10.1088/1742-6596/1984/1/012016</identifier><language>eng</language><publisher>Bristol: IOP Publishing</publisher><subject>Deposition ; Epitaxial growth ; Grooves ; Microscopy ; Molecular beams ; Nucleation ; Physics ; Raman spectra ; Reflection electron microscopy ; Sublimation</subject><ispartof>Journal of physics. Conference series, 2021-07, Vol.1984 (1), p.12016</ispartof><rights>Published under licence by IOP Publishing Ltd</rights><rights>2021. This work is published under http://creativecommons.org/licenses/by/3.0/ (the “License”). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43</citedby><cites>FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.proquest.com/docview/2572261618?pq-origsite=primo$$EHTML$$P50$$Gproquest$$Hfree_for_read</linktohtml><link.rule.ids>314,780,784,25753,27924,27925,37012,44590</link.rule.ids></links><search><creatorcontrib>Ponomarev, S A</creatorcontrib><creatorcontrib>Rogilo, D I</creatorcontrib><creatorcontrib>Kurus, N N</creatorcontrib><creatorcontrib>Basalaeva, L S</creatorcontrib><creatorcontrib>Kokh, K A</creatorcontrib><creatorcontrib>Milekhin, A G</creatorcontrib><creatorcontrib>Sheglov, D V</creatorcontrib><creatorcontrib>Latyshev, A V</creatorcontrib><title>In situ reflection electron microscopy for investigation of surface processes on Bi2Se3(0001)</title><title>Journal of physics. Conference series</title><addtitle>J. Phys.: Conf. Ser</addtitle><description>The sublimation and van der Waals (vdW) epitaxy on Bi
2
Se
3
(0001) surface have been first visualized using
in situ
reflection electron microscopy. When Bi
2
Se
3
(0001) surface was exposed to a Se molecular beam (up to 0.1 nm/s) and heated to ∼400°C, we observed ascending motion of atomic steps corresponding to congruent Bi
2
Se
3
sublimation. During the sublimation, grooves made by probe lithography act as sources of atomic steps: groove depth increases and generates atomic steps that move in the ascending direction away from the source. We used this phenomenon to create self-organized regularly-spaced zigzag atomic steps having 1 nm height on the Bi
2
Se
3
(0001) surface. The deposition of Bi (up to ∼0.01 nm/s) onto the Bi
2
Se
3
(0001) surface at constant Se flux (up to ∼0.1 nm/s) reversed the direction of the step flow, and vdW epitaxy was observed. The deposition of In and Se onto the Bi
2
Se
3
(0001) surface at ∼400°C led to the epitaxial growth of layered In
2
Se
3
. This vdW heteroepitaxy started with 2D island nucleation and, after 3–5 nm growth, continued with a screw-dislocation-driven formation of 3D islands.
Ex situ
Raman scattering measurements have shown that the grown 20-nm-thick In
2
Se
3
film exhibits vibrational modes that originate from the β-In
2
Se
3
crystal phase.</description><subject>Deposition</subject><subject>Epitaxial growth</subject><subject>Grooves</subject><subject>Microscopy</subject><subject>Molecular beams</subject><subject>Nucleation</subject><subject>Physics</subject><subject>Raman spectra</subject><subject>Reflection electron microscopy</subject><subject>Sublimation</subject><issn>1742-6588</issn><issn>1742-6596</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><sourceid>PIMPY</sourceid><recordid>eNqFUF1LwzAULaLgnP4GA76oUHuTtGn6qMNPBgrTRwlpmkjGttRkFfbvTa1MBMH7cg_JOefee5LkGMMFBs4zXOYkZUXFMlzxPMMZYAKY7SSj7c_uFnO-nxyEMAegscpR8nq_QsGuO-S1WWi1tm6FdA98BEurvAvKtRtknEd29aHD2r7JL5YzKHTeSKVR653SIeiA4vuVJTNNTwEAnx0me0Yugj767uPk5eb6eXKXTh9v7yeX01RRwllKc0mKErQhhDQ4wloD1A2mFVUUZK1KMCBlxTQH3dRcSSxlUSpFWVXUOqfj5GTwjZu8d3FJMXedX8WRIroRwjDDPLLKgdVfFeLBovV2Kf1GYBB9lqJPSfSJiT5LgcWQZVTSQWld-2P9v-r8D9XD02T2myjaxtBPqPGDQA</recordid><startdate>20210701</startdate><enddate>20210701</enddate><creator>Ponomarev, S A</creator><creator>Rogilo, D I</creator><creator>Kurus, N N</creator><creator>Basalaeva, L S</creator><creator>Kokh, K A</creator><creator>Milekhin, A G</creator><creator>Sheglov, D V</creator><creator>Latyshev, A V</creator><general>IOP Publishing</general><scope>O3W</scope><scope>TSCCA</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>8FE</scope><scope>8FG</scope><scope>ABUWG</scope><scope>AFKRA</scope><scope>ARAPS</scope><scope>AZQEC</scope><scope>BENPR</scope><scope>BGLVJ</scope><scope>CCPQU</scope><scope>DWQXO</scope><scope>H8D</scope><scope>HCIFZ</scope><scope>L7M</scope><scope>P5Z</scope><scope>P62</scope><scope>PIMPY</scope><scope>PQEST</scope><scope>PQQKQ</scope><scope>PQUKI</scope><scope>PRINS</scope></search><sort><creationdate>20210701</creationdate><title>In situ reflection electron microscopy for investigation of surface processes on Bi2Se3(0001)</title><author>Ponomarev, S A ; Rogilo, D I ; Kurus, N N ; Basalaeva, L S ; Kokh, K A ; Milekhin, A G ; Sheglov, D V ; Latyshev, A V</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>Deposition</topic><topic>Epitaxial growth</topic><topic>Grooves</topic><topic>Microscopy</topic><topic>Molecular beams</topic><topic>Nucleation</topic><topic>Physics</topic><topic>Raman spectra</topic><topic>Reflection electron microscopy</topic><topic>Sublimation</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ponomarev, S A</creatorcontrib><creatorcontrib>Rogilo, D I</creatorcontrib><creatorcontrib>Kurus, N N</creatorcontrib><creatorcontrib>Basalaeva, L S</creatorcontrib><creatorcontrib>Kokh, K A</creatorcontrib><creatorcontrib>Milekhin, A G</creatorcontrib><creatorcontrib>Sheglov, D V</creatorcontrib><creatorcontrib>Latyshev, A V</creatorcontrib><collection>IOP Publishing (Open access)</collection><collection>IOPscience (Open Access)</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>ProQuest SciTech Collection</collection><collection>ProQuest Technology Collection</collection><collection>ProQuest Central (Alumni)</collection><collection>ProQuest Central</collection><collection>Advanced Technologies & Aerospace Database (1962 - current)</collection><collection>ProQuest Central Essentials</collection><collection>ProQuest Central</collection><collection>Technology Collection</collection><collection>ProQuest One Community College</collection><collection>ProQuest Central</collection><collection>Aerospace Database</collection><collection>SciTech Premium Collection (Proquest) (PQ_SDU_P3)</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Advanced Technologies & Aerospace Database</collection><collection>ProQuest Advanced Technologies & Aerospace Collection</collection><collection>Publicly Available Content Database</collection><collection>ProQuest One Academic Eastern Edition (DO NOT USE)</collection><collection>ProQuest One Academic</collection><collection>ProQuest One Academic UKI Edition</collection><collection>ProQuest Central China</collection><jtitle>Journal of physics. Conference series</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ponomarev, S A</au><au>Rogilo, D I</au><au>Kurus, N N</au><au>Basalaeva, L S</au><au>Kokh, K A</au><au>Milekhin, A G</au><au>Sheglov, D V</au><au>Latyshev, A V</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>In situ reflection electron microscopy for investigation of surface processes on Bi2Se3(0001)</atitle><jtitle>Journal of physics. Conference series</jtitle><addtitle>J. Phys.: Conf. Ser</addtitle><date>2021-07-01</date><risdate>2021</risdate><volume>1984</volume><issue>1</issue><spage>12016</spage><pages>12016-</pages><issn>1742-6588</issn><eissn>1742-6596</eissn><abstract>The sublimation and van der Waals (vdW) epitaxy on Bi
2
Se
3
(0001) surface have been first visualized using
in situ
reflection electron microscopy. When Bi
2
Se
3
(0001) surface was exposed to a Se molecular beam (up to 0.1 nm/s) and heated to ∼400°C, we observed ascending motion of atomic steps corresponding to congruent Bi
2
Se
3
sublimation. During the sublimation, grooves made by probe lithography act as sources of atomic steps: groove depth increases and generates atomic steps that move in the ascending direction away from the source. We used this phenomenon to create self-organized regularly-spaced zigzag atomic steps having 1 nm height on the Bi
2
Se
3
(0001) surface. The deposition of Bi (up to ∼0.01 nm/s) onto the Bi
2
Se
3
(0001) surface at constant Se flux (up to ∼0.1 nm/s) reversed the direction of the step flow, and vdW epitaxy was observed. The deposition of In and Se onto the Bi
2
Se
3
(0001) surface at ∼400°C led to the epitaxial growth of layered In
2
Se
3
. This vdW heteroepitaxy started with 2D island nucleation and, after 3–5 nm growth, continued with a screw-dislocation-driven formation of 3D islands.
Ex situ
Raman scattering measurements have shown that the grown 20-nm-thick In
2
Se
3
film exhibits vibrational modes that originate from the β-In
2
Se
3
crystal phase.</abstract><cop>Bristol</cop><pub>IOP Publishing</pub><doi>10.1088/1742-6596/1984/1/012016</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
fulltext | fulltext |
identifier | ISSN: 1742-6588 |
ispartof | Journal of physics. Conference series, 2021-07, Vol.1984 (1), p.12016 |
issn | 1742-6588 1742-6596 |
language | eng |
recordid | cdi_proquest_journals_2572261618 |
source | Publicly Available Content Database; Full-Text Journals in Chemistry (Open access) |
subjects | Deposition Epitaxial growth Grooves Microscopy Molecular beams Nucleation Physics Raman spectra Reflection electron microscopy Sublimation |
title | In situ reflection electron microscopy for investigation of surface processes on Bi2Se3(0001) |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T15%3A35%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=In%20situ%20reflection%20electron%20microscopy%20for%20investigation%20of%20surface%20processes%20on%20Bi2Se3(0001)&rft.jtitle=Journal%20of%20physics.%20Conference%20series&rft.au=Ponomarev,%20S%20A&rft.date=2021-07-01&rft.volume=1984&rft.issue=1&rft.spage=12016&rft.pages=12016-&rft.issn=1742-6588&rft.eissn=1742-6596&rft_id=info:doi/10.1088/1742-6596/1984/1/012016&rft_dat=%3Cproquest_cross%3E2572261618%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c3286-34a2570ef222d1257be00bd1393c30abc70f0aa96e80edb8ca1aa57cc3695be43%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2572261618&rft_id=info:pmid/&rfr_iscdi=true |