Vacuum coating system for deposition of superconducting W x Si (1– x ) ultrathin films used in single photon detectors

VUP-11M coating system for thin films deposition in vacuum is described in this article. Technological features which appear at laboratory vacuum system modernization for implementation of dual-components W x Si(1–x) films forming process by means of magnetron co-sputtering from two sources are show...

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Bibliographic Details
Published in:Journal of physics. Conference series 2017-07, Vol.872 (1), p.12027
Main Authors: Vasilev, D D, Malevannaya, E I, Moiseev, K M
Format: Article
Language:English
Subjects:
Deposition
Magnetron sputtering
Modernization
Physics
Thin films
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Summary:VUP-11M coating system for thin films deposition in vacuum is described in this article. Technological features which appear at laboratory vacuum system modernization for implementation of dual-components W x Si(1–x) films forming process by means of magnetron co-sputtering from two sources are shown. Totals of the system modernization and research results of obtained W x Si(1–x) films are reported.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/872/1/012027