Optical properties of nanostructured TiO2 thin films

Nanostructured titanium dioxide (TiO2) thin films were prepared with one and two layers on glass substrates (ITO) using sol gel-spin coating technique and annealed at temperature ranging from 300°C to 600°C. X-ray diffraction (XRD) and UV-Vis transmittance spectroscopy were used to study the effects...

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Bibliographic Details
Main Authors: M Ben Karoui, Kaddachi, Z, Gharbi, R
Format: Conference Proceeding
Language:English
Subjects:
Anatase
Annealing
Glass substrates
Nanostructure
Optical properties
Physics
Refractivity
Sol-gel processes
Solid phases
Spectrum analysis
Spin coating
Thin films
Titanium dioxide
X-ray diffraction
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Summary:Nanostructured titanium dioxide (TiO2) thin films were prepared with one and two layers on glass substrates (ITO) using sol gel-spin coating technique and annealed at temperature ranging from 300°C to 600°C. X-ray diffraction (XRD) and UV-Vis transmittance spectroscopy were used to study the effects of annealing temperature on the structural and optical properties. X-ray diffraction studies showed that the as-deposited films were amorphous and at first changed to anatase phase with increase of annealing temperature. Optical constants of these films were derived from the transmission and reflection spectra subjected to annealing at different temperatures. The results indicate that an anatase phase structure TiO2 thin film with nanocrystallite size of about 10.72 nm can be observed at 400°C. The optical gap decreases from 3.82 eV to 3.74.eV for one layer and from 3.64 eV to 3.5 eV for two layers when the annealing temperature increases from 300 °C to 600°C. The refractive index is low compared to a pore free anatase TiO2 and it increases contrary to the porosity which is reduced with the raising of the annealing temperature.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/596/1/012012