Mo/Si and MoSi2/Si nanostructures for multilayer Laue lens

To develop a multilayer Laue lens (MLL), we fabricated depth-graded Mo/Si and MoSi2/Si multilayers with each boundary according to the Fresnel zone configuration. The multilayers were deposited by magnetron sputtering. From the result of SEM image analysis of the multilayer cross sections, MoSi2/Si...

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Bibliographic Details
Published in:Journal of physics. Conference series 2009-09, Vol.186 (1), p.012074
Main Authors: Takenaka, H, Ichimaru, S, Ohchi, T, Koyama, T, Tsuji, T, Takano, H, Kagoshima, Y
Format: Article
Language:English
Subjects:
Blurring
Fresnel zones
Image analysis
Lenses
Magnetron sputtering
Molybdenum disilicides
Multilayers
Physics
Thickness
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Summary:To develop a multilayer Laue lens (MLL), we fabricated depth-graded Mo/Si and MoSi2/Si multilayers with each boundary according to the Fresnel zone configuration. The multilayers were deposited by magnetron sputtering. From the result of SEM image analysis of the multilayer cross sections, MoSi2/Si multilayer had smaller layer-thickness errors than Mo/Si multilayer. In addition, from the result of the focusing test by using 20-keV X-rays, the measured beam size of MoSi2/Si MLL had a small blurring from the diffraction limited beam size. These results suggest that MoSi2/Si multilayer is better suited than Mo/Si multilayer for use as an MLL in hard x-ray nanofocusing.
ISSN:1742-6596
1742-6588
1742-6596
DOI:10.1088/1742-6596/186/1/012074