Spray Coating of Photoresist for 3D Microstructures with Different Geometries

This paper presents the advantages of spray coating technique as compared to the conventional spin coating method for photoresist coating of 3D microstructures. An optimized mix of photoresist AZ4620: MEK: PGMEA (1:1.5:0.5) was used to achieve good coverage and uniformity of photoresist not only on...

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Bibliographic Details
Published in:Journal of physics. Conference series 2006-04, Vol.34 (1), p.937-942
Main Authors: Yu, Liming, Lee, Yong Yeow, Tay, Francis E H, Iliescu, Ciprian
Format: Article
Language:English
Subjects:
Microstructure
Photoresists
Physics
Spin coating
Spray coating
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Summary:This paper presents the advantages of spray coating technique as compared to the conventional spin coating method for photoresist coating of 3D microstructures. An optimized mix of photoresist AZ4620: MEK: PGMEA (1:1.5:0.5) was used to achieve good coverage and uniformity of photoresist not only on planar surface, but also along the trenches' sidewall. In order to achieve the ideal coverage of photoresist layer, the effects of the geometries of the microstructures were also considered. Then, we implement this technique for our application in a MEMS device to prove the viability and potentiality of spray coating of photoresist for fabrication of 3D microstructures.
ISSN:1742-6596
1742-6588
1742-6596
DOI:10.1088/1742-6596/34/1/155