Effect of the Ion-Plasma Process Parameters on the Texture and Properties of TiN and ZrN Coatings

X-ray diffraction analysis is used to study the formation of crystallographic texture in vacuum ion-plasma TiN and ZrN coatings as a function of the bias voltage at a substrate. At a low bias voltage (–10 V), textureless state is shown to form in the TiN and ZrN films; as the bias voltage increases...

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Bibliographic Details
Published in:Russian metallurgy Metally 2021-10, Vol.2021 (10), p.1238-1244
Main Authors: Betsofen, S. Ya, Ashmarin, A. A., Petrov, L. M., Grushin, I. A., Lebedev, M. A.
Format: Article
Language:English
Subjects:
Advanced Materials and Technologies
Anisotropy
Bias
Chemistry and Materials Science
Coatings
Crystallography
Electric potential
Materials Science
Metallic Materials
Modulus of elasticity
Process parameters
Substrates
Texture
Voltage
Zirconium nitrides
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Summary:X-ray diffraction analysis is used to study the formation of crystallographic texture in vacuum ion-plasma TiN and ZrN coatings as a function of the bias voltage at a substrate. At a low bias voltage (–10 V), textureless state is shown to form in the TiN and ZrN films; as the bias voltage increases to –100 V, a clear (111) texture is found in the TiN coatings, whereas, in the ZrN coatings, a two-component texture (111) + (113) forms. An increase in the bias voltage to –100 V leads to a twofold decrease in the hardness of the coatings. A selection criterion of texture component is suggested, which is based on the preferred orientations that ensure the minimum anisotropy of the Young modulus in the texture component plane.
ISSN:0036-0295
1555-6255
1531-8648
DOI:10.1134/S0036029521100037