MICROSTRUCTURE OF IRIDIUM ENRICHED PtxIr(1–x) FILMS PREPARED BY CHEMICAL VAPOR DEPOSITION

• Published in: Journal of structural chemistry 2021-09, Vol.62 (9), p.1447-1456
• Main Authors: Dorovskikh, S. I., Vikulova, E. S., Korolkov, I. V., Maksimovskiy, E. A., Kal’nyi, D. B., Morozova, N. B.
• Format: Article
• Language: English
• Subjects: Admixtures; Atomic; Atomic/Molecular Structure and Spectra; Chemical vapor deposition; Chemistry; Chemistry and Materials Science; Inorganic Chemistry; Iridium; Molecular; Optical and Plasma Physics; Physical Chemistry; Reagents; Solid solutions; Solid State Physics; Thickness; Titanium
• ISSN: 0022-4766; 1573-8779
• DOI: 10.1134/S0022476621090146

MOCVD processes for the fabrication of Pt x Ir (1– x ) films ( x  < 0.3, thickness 1.5-1.8 µm) on the contacts of diagnostic electrodes and titanium discs are developed using a combination of Pt(II) and Ir(I) acetylacetonate (acac) derivatives (Pt(acac) 2 , Ir(cod)(acac) (cod = cyclooctadiene-1,5) and oxygen as a gas reagent. It is shown that the ratios of metals in the films prepared on different types of supports are similar within the same experiment. The films contain phases of solid solution Pt x Ir (1– x ) without admixtures of metallic and oxide phases; the ratio of metals in the sample volume corresponds to the one experimentally specified. EDS and XPS methods determine a lower iridium content after the formation of Pt x Ir (1– x ) films in the subsurface layers (10 nm) than the XRD method. The surface of Pt x Ir (1– x ) films consists of agglomerates formed by small particles. When the Pt content decreases from x  = 0.3 to x = 0.2, the average size of these particles decreases from 29 nm to 24–25 nm and then remains virtually constant. The capacitance values of contacts with Pt x Ir (1– x ) films vary within 62.6-84.5 mC/cm 2 .