Loading…
Unraveling the molecular-level structures and distribution of refractory sulfur compounds during residue hydrotreating process
Molecular-level structures and distribution of refractory polycyclic aromatic sulfur heterocycles (PASHs) during residue hydrotreating process (RHT) are investigated. A prior atmospheric pressure photoionization (APPI) FT-ICR MS was used to obtain the distribution of refractory PASHs. Then the key r...
Saved in:
Published in: | Fuel processing technology 2021-12, Vol.224, p.107025, Article 107025 |
---|---|
Main Authors: | , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
cited_by | cdi_FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613 |
---|---|
cites | cdi_FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613 |
container_end_page | |
container_issue | |
container_start_page | 107025 |
container_title | Fuel processing technology |
container_volume | 224 |
creator | Zhao, Jiamin Dai, Lishun Wang, Wei Liu, Tao Ren, Liang Zhang, Le Han, Wei Li, Dadong |
description | Molecular-level structures and distribution of refractory polycyclic aromatic sulfur heterocycles (PASHs) during residue hydrotreating process (RHT) are investigated. A prior atmospheric pressure photoionization (APPI) FT-ICR MS was used to obtain the distribution of refractory PASHs. Then the key refractory PASHs were further dissociated by collision-induced dissociation (CID) to identify the isomers and gain their fragment ions. During deep hydrodesulfurization (HDS), S1 class compounds detected in the RHT products was identified as the major refractory sulfur compounds. Moreover, an increase in the aromatic structure of S1 class species is present during RHT. The key refractory PASHs are these with DBE = 9–12, which also determine HDS depth during RHT process. From the CID experiments, as indicated by an increase of abundance of fragmentation of alkyl(C1-C4)-substituted DBT, alkyl(C2)-substituted DBT in particular, these key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT. In addition, the molecular chemical formula and molecular structure for these key refractory PASHs were proposed, shedding a light on the development of industrial HDS catalysts and optimization of RHT process
[Display omitted]
•The refractory PASHs during RHT were identified by FT-ICR mass spectrometry with narrow ion isolation windows.•The DBE value for the key refractory PASHs is 9–12.•The key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT. |
doi_str_mv | 10.1016/j.fuproc.2021.107025 |
format | article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2600352928</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0378382021003040</els_id><sourcerecordid>2600352928</sourcerecordid><originalsourceid>FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613</originalsourceid><addsrcrecordid>eNp9UMtq5DAQFMsGdnayf7AHQc6e6GFb9iUQQl4QyCU5C1lqbzR4rNmWFJhLvj0yzjmnhqIeXUXIX852nPH2cr8b8xGD3QkmeIEUE80PsuGdkpXiXfeTbJhUXSU7wX6R3zHuGWNN06sN-Xid0bzD5Od_NL0BPYQJbJ4MVhMUmMaE2aaMEKmZHXW-AH7IyYeZhpEijGhsCniiMU9jRmrD4Rjy7CJ1GRfXIvUuA307OQwJwaQFXd6FGM_J2WimCH--7pa83t2-3DxUT8_3jzfXT5WVsk6VY7ZVrbK1UaozzTBINVhphGyEUr0TY90zaPvBcgVQ87YG1fCxt5K5xrQtl1tysfqW3P8ZYtL7kHEukVq0jBWfXnSFVa8siyHG0k0f0R8MnjRnella7_W6tF6W1uvSRXa1yqA0ePeAOloPswXnEWzSLvjvDT4B-tmMqg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2600352928</pqid></control><display><type>article</type><title>Unraveling the molecular-level structures and distribution of refractory sulfur compounds during residue hydrotreating process</title><source>ScienceDirect Journals</source><creator>Zhao, Jiamin ; Dai, Lishun ; Wang, Wei ; Liu, Tao ; Ren, Liang ; Zhang, Le ; Han, Wei ; Li, Dadong</creator><creatorcontrib>Zhao, Jiamin ; Dai, Lishun ; Wang, Wei ; Liu, Tao ; Ren, Liang ; Zhang, Le ; Han, Wei ; Li, Dadong</creatorcontrib><description>Molecular-level structures and distribution of refractory polycyclic aromatic sulfur heterocycles (PASHs) during residue hydrotreating process (RHT) are investigated. A prior atmospheric pressure photoionization (APPI) FT-ICR MS was used to obtain the distribution of refractory PASHs. Then the key refractory PASHs were further dissociated by collision-induced dissociation (CID) to identify the isomers and gain their fragment ions. During deep hydrodesulfurization (HDS), S1 class compounds detected in the RHT products was identified as the major refractory sulfur compounds. Moreover, an increase in the aromatic structure of S1 class species is present during RHT. The key refractory PASHs are these with DBE = 9–12, which also determine HDS depth during RHT process. From the CID experiments, as indicated by an increase of abundance of fragmentation of alkyl(C1-C4)-substituted DBT, alkyl(C2)-substituted DBT in particular, these key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT. In addition, the molecular chemical formula and molecular structure for these key refractory PASHs were proposed, shedding a light on the development of industrial HDS catalysts and optimization of RHT process
[Display omitted]
•The refractory PASHs during RHT were identified by FT-ICR mass spectrometry with narrow ion isolation windows.•The DBE value for the key refractory PASHs is 9–12.•The key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT.</description><identifier>ISSN: 0378-3820</identifier><identifier>EISSN: 1873-7188</identifier><identifier>DOI: 10.1016/j.fuproc.2021.107025</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>FT-ICR mass spectrometry ; Hydrodesulfurization ; Isomers ; Molecular structure ; Optimization ; Photoionization ; Residual oils ; Residues ; Substitutes ; Sulfur ; Sulfur compounds ; Sulfur removal ; Sulfur-containing compounds</subject><ispartof>Fuel processing technology, 2021-12, Vol.224, p.107025, Article 107025</ispartof><rights>2021 Elsevier B.V.</rights><rights>Copyright Elsevier Science Ltd. Dec 15, 2021</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613</citedby><cites>FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Zhao, Jiamin</creatorcontrib><creatorcontrib>Dai, Lishun</creatorcontrib><creatorcontrib>Wang, Wei</creatorcontrib><creatorcontrib>Liu, Tao</creatorcontrib><creatorcontrib>Ren, Liang</creatorcontrib><creatorcontrib>Zhang, Le</creatorcontrib><creatorcontrib>Han, Wei</creatorcontrib><creatorcontrib>Li, Dadong</creatorcontrib><title>Unraveling the molecular-level structures and distribution of refractory sulfur compounds during residue hydrotreating process</title><title>Fuel processing technology</title><description>Molecular-level structures and distribution of refractory polycyclic aromatic sulfur heterocycles (PASHs) during residue hydrotreating process (RHT) are investigated. A prior atmospheric pressure photoionization (APPI) FT-ICR MS was used to obtain the distribution of refractory PASHs. Then the key refractory PASHs were further dissociated by collision-induced dissociation (CID) to identify the isomers and gain their fragment ions. During deep hydrodesulfurization (HDS), S1 class compounds detected in the RHT products was identified as the major refractory sulfur compounds. Moreover, an increase in the aromatic structure of S1 class species is present during RHT. The key refractory PASHs are these with DBE = 9–12, which also determine HDS depth during RHT process. From the CID experiments, as indicated by an increase of abundance of fragmentation of alkyl(C1-C4)-substituted DBT, alkyl(C2)-substituted DBT in particular, these key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT. In addition, the molecular chemical formula and molecular structure for these key refractory PASHs were proposed, shedding a light on the development of industrial HDS catalysts and optimization of RHT process
[Display omitted]
•The refractory PASHs during RHT were identified by FT-ICR mass spectrometry with narrow ion isolation windows.•The DBE value for the key refractory PASHs is 9–12.•The key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT.</description><subject>FT-ICR mass spectrometry</subject><subject>Hydrodesulfurization</subject><subject>Isomers</subject><subject>Molecular structure</subject><subject>Optimization</subject><subject>Photoionization</subject><subject>Residual oils</subject><subject>Residues</subject><subject>Substitutes</subject><subject>Sulfur</subject><subject>Sulfur compounds</subject><subject>Sulfur removal</subject><subject>Sulfur-containing compounds</subject><issn>0378-3820</issn><issn>1873-7188</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2021</creationdate><recordtype>article</recordtype><recordid>eNp9UMtq5DAQFMsGdnayf7AHQc6e6GFb9iUQQl4QyCU5C1lqbzR4rNmWFJhLvj0yzjmnhqIeXUXIX852nPH2cr8b8xGD3QkmeIEUE80PsuGdkpXiXfeTbJhUXSU7wX6R3zHuGWNN06sN-Xid0bzD5Od_NL0BPYQJbJ4MVhMUmMaE2aaMEKmZHXW-AH7IyYeZhpEijGhsCniiMU9jRmrD4Rjy7CJ1GRfXIvUuA307OQwJwaQFXd6FGM_J2WimCH--7pa83t2-3DxUT8_3jzfXT5WVsk6VY7ZVrbK1UaozzTBINVhphGyEUr0TY90zaPvBcgVQ87YG1fCxt5K5xrQtl1tysfqW3P8ZYtL7kHEukVq0jBWfXnSFVa8siyHG0k0f0R8MnjRnella7_W6tF6W1uvSRXa1yqA0ePeAOloPswXnEWzSLvjvDT4B-tmMqg</recordid><startdate>20211215</startdate><enddate>20211215</enddate><creator>Zhao, Jiamin</creator><creator>Dai, Lishun</creator><creator>Wang, Wei</creator><creator>Liu, Tao</creator><creator>Ren, Liang</creator><creator>Zhang, Le</creator><creator>Han, Wei</creator><creator>Li, Dadong</creator><general>Elsevier B.V</general><general>Elsevier Science Ltd</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20211215</creationdate><title>Unraveling the molecular-level structures and distribution of refractory sulfur compounds during residue hydrotreating process</title><author>Zhao, Jiamin ; Dai, Lishun ; Wang, Wei ; Liu, Tao ; Ren, Liang ; Zhang, Le ; Han, Wei ; Li, Dadong</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2021</creationdate><topic>FT-ICR mass spectrometry</topic><topic>Hydrodesulfurization</topic><topic>Isomers</topic><topic>Molecular structure</topic><topic>Optimization</topic><topic>Photoionization</topic><topic>Residual oils</topic><topic>Residues</topic><topic>Substitutes</topic><topic>Sulfur</topic><topic>Sulfur compounds</topic><topic>Sulfur removal</topic><topic>Sulfur-containing compounds</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zhao, Jiamin</creatorcontrib><creatorcontrib>Dai, Lishun</creatorcontrib><creatorcontrib>Wang, Wei</creatorcontrib><creatorcontrib>Liu, Tao</creatorcontrib><creatorcontrib>Ren, Liang</creatorcontrib><creatorcontrib>Zhang, Le</creatorcontrib><creatorcontrib>Han, Wei</creatorcontrib><creatorcontrib>Li, Dadong</creatorcontrib><collection>CrossRef</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Fuel processing technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zhao, Jiamin</au><au>Dai, Lishun</au><au>Wang, Wei</au><au>Liu, Tao</au><au>Ren, Liang</au><au>Zhang, Le</au><au>Han, Wei</au><au>Li, Dadong</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Unraveling the molecular-level structures and distribution of refractory sulfur compounds during residue hydrotreating process</atitle><jtitle>Fuel processing technology</jtitle><date>2021-12-15</date><risdate>2021</risdate><volume>224</volume><spage>107025</spage><pages>107025-</pages><artnum>107025</artnum><issn>0378-3820</issn><eissn>1873-7188</eissn><abstract>Molecular-level structures and distribution of refractory polycyclic aromatic sulfur heterocycles (PASHs) during residue hydrotreating process (RHT) are investigated. A prior atmospheric pressure photoionization (APPI) FT-ICR MS was used to obtain the distribution of refractory PASHs. Then the key refractory PASHs were further dissociated by collision-induced dissociation (CID) to identify the isomers and gain their fragment ions. During deep hydrodesulfurization (HDS), S1 class compounds detected in the RHT products was identified as the major refractory sulfur compounds. Moreover, an increase in the aromatic structure of S1 class species is present during RHT. The key refractory PASHs are these with DBE = 9–12, which also determine HDS depth during RHT process. From the CID experiments, as indicated by an increase of abundance of fragmentation of alkyl(C1-C4)-substituted DBT, alkyl(C2)-substituted DBT in particular, these key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT. In addition, the molecular chemical formula and molecular structure for these key refractory PASHs were proposed, shedding a light on the development of industrial HDS catalysts and optimization of RHT process
[Display omitted]
•The refractory PASHs during RHT were identified by FT-ICR mass spectrometry with narrow ion isolation windows.•The DBE value for the key refractory PASHs is 9–12.•The key refractory PASHs have a structure of alkyl(C2)-substituted DBT, such as 4,6-DMDBT.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.fuproc.2021.107025</doi></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0378-3820 |
ispartof | Fuel processing technology, 2021-12, Vol.224, p.107025, Article 107025 |
issn | 0378-3820 1873-7188 |
language | eng |
recordid | cdi_proquest_journals_2600352928 |
source | ScienceDirect Journals |
subjects | FT-ICR mass spectrometry Hydrodesulfurization Isomers Molecular structure Optimization Photoionization Residual oils Residues Substitutes Sulfur Sulfur compounds Sulfur removal Sulfur-containing compounds |
title | Unraveling the molecular-level structures and distribution of refractory sulfur compounds during residue hydrotreating process |
url | http://sfxeu10.hosted.exlibrisgroup.com/loughborough?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T14%3A36%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Unraveling%20the%20molecular-level%20structures%20and%20distribution%20of%20refractory%20sulfur%20compounds%20during%20residue%20hydrotreating%20process&rft.jtitle=Fuel%20processing%20technology&rft.au=Zhao,%20Jiamin&rft.date=2021-12-15&rft.volume=224&rft.spage=107025&rft.pages=107025-&rft.artnum=107025&rft.issn=0378-3820&rft.eissn=1873-7188&rft_id=info:doi/10.1016/j.fuproc.2021.107025&rft_dat=%3Cproquest_cross%3E2600352928%3C/proquest_cross%3E%3Cgrp_id%3Ecdi_FETCH-LOGICAL-c334t-d0c6767c4a778a5bb37bc3a2352779d2f490e69bc17ee4164e751f9c30d5a6613%3C/grp_id%3E%3Coa%3E%3C/oa%3E%3Curl%3E%3C/url%3E&rft_id=info:oai/&rft_pqid=2600352928&rft_id=info:pmid/&rfr_iscdi=true |