Corrosion behavior and surface characterization of an equiatomic CoCrFeMoNi high-entropy alloy under various pH conditions

•The HEA displayed the electronic structure of n–p heterojunction.•Co, Fe and Ni were depleted in the passive films.•Co and Ni contributed less to the passive film formation.•The stability of Fe was markedly enhanced with the increase of pH. The corrosion behavior and surface characterization of an...

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Bibliographic Details
Published in:Journal of alloys and compounds 2022-04, Vol.900, p.163432, Article 163432
Main Authors: Wang, Zhu, Zhang, Guo-Hui, Fan, Xue-Hua, Jin, Jie, Zhang, Lei, Du, Yan-Xia
Format: Article
Language:English
Subjects:
Chromium
Corrosion
Electronic structure
HEA
Heterojunctions
High entropy alloys
Iron
Molybdenum
Mott–Schottky
Nickel
Oxygen enrichment
Passive film
Surface properties
XPS
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Summary:•The HEA displayed the electronic structure of n–p heterojunction.•Co, Fe and Ni were depleted in the passive films.•Co and Ni contributed less to the passive film formation.•The stability of Fe was markedly enhanced with the increase of pH. The corrosion behavior and surface characterization of an equiatomic CoCrFeMoNi high-entropy alloy (HEA) under various pH conditions were investigated by Mott–Schottky measurements, EIS, polarization, and XPS. The results showed that the passive films formed on the HEA displayed the n–p heterojunction electronic structure due to the generation of different semiconducting constituents. As the pH increased, the donor density decreased, which was attributed to the acceleration in the annihilation rate of the oxygen vacancies. Cr and Mo species were stable and were found enriched in the passive films, while substances of Co, Fe and Ni were depleted, independent of pH. Co and Ni mainly existed in the films in their metallic forms, both of which contributed less to the passive film formation. The stability of Fe was markedly enhanced with the pH increasing, resulting in the main components of the passive films changing from Cr and Mo to Cr, Fe and Mo.
ISSN:0925-8388
1873-4669
DOI:10.1016/j.jallcom.2021.163432