The Influence of Metal Masks on Matching of the Lower Electrode and a High-Frequency Bias Generator at Reactive Ion Etching of Large Substrates

The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at selective reactive ion mask etching of large substrates in Freon-14 has been investigated both theoretically and experimentally. It is shown for masks with a coating of substrates of more than 30%...

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Bibliographic Details
Published in:Technical physics letters 2021-08, Vol.47 (8), p.569-572
Main Authors: Poletayev, S. D., Lyubimov, A. I.
Format: Article
Language:English
Subjects:
Bias
Classical and Continuum Physics
Coated electrodes
Electrodes
Masks
Matching
Physics
Physics and Astronomy
Reactive ion etching
Reactive power
Substrates
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Summary:The influence of metal masks on matching of the lower electrode and a high-frequency bias generator at selective reactive ion mask etching of large substrates in Freon-14 has been investigated both theoretically and experimentally. It is shown for masks with a coating of substrates of more than 30% that the reactive power component increases at distances from the center that are close to the substrate radius. It is established that the specific reactive power is independent of the thickness and type of metal masks. It is shown experimentally that masks with any substrate-coating coefficient of practical importance connected to the lower electrode via a substrate holder improve matching by decreasing the power reflectance.
ISSN:1063-7850
1090-6533
DOI:10.1134/S1063785021060122