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High performance of broadband anti-reflection film by glancing angle deposition
This study reports that SiO 2 was selected to fabricate broadband anti-reflection (AR) films on fused silica substrates by using glancing angle deposition and substrate rotation. Through accurate control of the graded index of the SiO 2 layer, the average residual reflectance of the graded broadband...
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Published in: | Optical materials express 2022-06, Vol.12 (6), p.2226 |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | This study reports that SiO 2 was selected to fabricate broadband anti-reflection (AR) films on fused silica substrates by using glancing angle deposition and substrate rotation. Through accurate control of the graded index of the SiO 2 layer, the average residual reflectance of the graded broadband AR film can achieve an average value of 0.59% across a spectral range of 400-1800nm. By comparing the performance, the broadband anti-reflection film with substrate speed has higher stability compared with the broadband anti-reflection film without substrate speed and a higher damage threshold than the traditional anti-reflection film. |
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ISSN: | 2159-3930 2159-3930 |
DOI: | 10.1364/OME.459950 |