Development of nanometer-thick graphite film extreme ultraviolet pellicle with hydrogen-resistant TiN capping layer

TiN has beneficial physicochemical properties, such as high hardness, good chemical inertness, and good corrosion resistance. TiN has been used for optical filters and protective coatings to exploit these properties. We deposited TiN using atomic layer deposition as a capping layer for a pellicle. W...

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Bibliographic Details
Published in:Materials research express 2022-06, Vol.9 (6), p.66403
Main Authors: Yeo, Jin-Ho, Nam, Ki-Bong, Kang, Gil-Seon, Hu, Qicheng, Jeong, Chang-Young, Park, Young-Soo, Lee, Seok Jong, Jung, Jaesun, Lee, Seung Hyun, Cho, Deok Hyun, Kim, Mun-Ja, Yoo, Ji-Beom
Format: Article
Language:English
Subjects:
Atomic force microscopy
Atomic layer epitaxy
Capping
Chemical bonds
Corrosion resistance
EUV pellicle
Hydrogen plasma
hydrogen resistance
nanometer-thick graphite film
Nitrogen compounds
Optical filters
Optical properties
Pellicle
Photoelectrons
Protective coatings
Raman spectroscopy
Thickness
titanium nitride
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Summary:TiN has beneficial physicochemical properties, such as high hardness, good chemical inertness, and good corrosion resistance. TiN has been used for optical filters and protective coatings to exploit these properties. We deposited TiN using atomic layer deposition as a capping layer for a pellicle. We investigated the hydrogen plasma resistance using Raman spectroscopy, transmission electron microscopy, atomic force microscopy, and x-ray photoelectron spectroscopy. As the hydrogen plasma exposure time increased, bonds formed between the TiN film and nitrogen compounds. With long-term exposure, the thickness of the TiN film decreased owing to etching.
ISSN:2053-1591
2053-1591
DOI:10.1088/2053-1591/ac7850