48‐1: Solid‐State Laser Crystallization for Poly‐Si TFTs and Their Applications

We demonstrate for the first time that a pulsed solid‐state laser with a wavelength of 343 nm has the potential to fabricate poly‐Si films equivalent to the conventional ones and that they can be applied to TFTs and OLED displays for practical use. This suggests that this laser could replace the exc...

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Bibliographic Details
Published in:SID International Symposium Digest of technical papers 2022-06, Vol.53 (1), p.608-611
Main Authors: Tanabe, Hiroshi, Obata, Hideki, Hayashi, Ken-ichi, Hamada, Keita, Shoji, Isao, Mori, Shigeru
Format: Article
Language:English
Subjects:
AM-OLED
Crystallization
display
excimer laser
Excimer lasers
Excimers
laser crystallization
LTPS
poly-Si TFT
Silicon films
solid-sate laser
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Summary:We demonstrate for the first time that a pulsed solid‐state laser with a wavelength of 343 nm has the potential to fabricate poly‐Si films equivalent to the conventional ones and that they can be applied to TFTs and OLED displays for practical use. This suggests that this laser could replace the excimer laser used in the crystallization process for LTPS technology and also that it might contribute to reducing the cost of ownership in industry.
ISSN:0097-966X
2168-0159
DOI:10.1002/sdtp.15561