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Properties enhancement of TiO2 nanorod thin film using hydrochloric acid etching treatment method
The properties of the as-deposited and etched TiO 2 nanorod were characterized using X-ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), Atomic Force Microscopy (AFM), and Four-Point Probe. Titanium dioxide (TiO 2 ) nanorod was successfully grown on fluorine-doped tin oxide...
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Published in: | Journal of materials science. Materials in electronics 2022-07, Vol.33 (20), p.16348-16356 |
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Main Authors: | , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The properties of the as-deposited and etched TiO
2
nanorod were characterized using X-ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), Atomic Force Microscopy (AFM), and Four-Point Probe. Titanium dioxide (TiO
2
) nanorod was successfully grown on fluorine-doped tin oxide (FTO) substrate using the hydrothermal method. In this study, hydrothermal etching treatment using hydrochloric acid (HCl) is introduced to improve the surface area of TiO
2
nanorod and increase the charge transfer. The effect of HCl concentration in etching treatment is intensively studied. As the concentration of HCl increases, the crystallinity of TiO
2
also increases up to 0.03 M of HCl concentration and decreases onwards. Moreover, the as-deposited TiO
2
nanorods morphology changes to nanowires, then nanocaves after the etching treatment procedure. Eventually, when the concentration of HCl is inordinate, the TiO
2
nanorod becomes eroded. The increment of HCl concentration also influences the root mean square (RMS) roughness, the resistivity, and the sheet resistance of the sample. Based on this study, 0.03 M HCl shows the optimum value, which possessed high crystallinity with low resistivity compared to other parameters. By implying etching treatment on the TiO
2
nanorod, the HCl concentration significantly enhanced the nanorod TiO
2
properties. |
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ISSN: | 0957-4522 1573-482X |
DOI: | 10.1007/s10854-022-08526-w |