Micro- and Nanostructure of Layered Si\Sn\Si Films, Formed by Vapor Deposition

The peculiarities of surface relief of the Si-Sn-Si layered films, used to produce the silicon nanocrystals with properties of quantum dots, were studied by the methods of electron and atomic force microscopy with the involvement of X-ray fluorescent microanalysis. It was shown that the quasispheric...

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Bibliographic Details
Published in:Journal of nanomaterials 2022-01, Vol.2022 (1)
Main Authors: Neimash, V. B., Shepelyavyi, P. Ye, Nikolenko, A. S., Strelchuk, V. V., Chegel, V. I.
Format: Article
Language:English
Subjects:
Amorphous silicon
Atomic force microscopy
Crystallization
Fluorescence
Nanocrystals
Nanomaterials
Photovoltaic cells
Quantum dots
Sensors
Silicon
Silicon films
Thickness
Tin
Titanium nitride
Vacuum deposition
Vapor deposition
Vapor phases
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Summary:The peculiarities of surface relief of the Si-Sn-Si layered films, used to produce the silicon nanocrystals with properties of quantum dots, were studied by the methods of electron and atomic force microscopy with the involvement of X-ray fluorescent microanalysis. It was shown that the quasispherical structuring of the relief at the scale 20-20000 nm is typical for the surface of silicon-tin layered films. The role of layer thicknesses is experimentally analyzed under formation of the surface relief (roughness, shapes, and lateral dimensions) during their vacuum deposition from a vapor-gas phase. The peculiarities of the relief of amorphous silicon films deposited on the surface of molten tin are shown. The fractal-like type nanostructuring of amorphous silicon films deposited on the surface of liquid tin was discovered.
ISSN:1687-4110
1687-4129
DOI:10.1155/2022/7910708