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Epitaxial growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics
Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS 2 have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS 2...
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Published in: | Nano research 2022-07, Vol.15 (7), p.6628-6635 |
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Main Authors: | , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS
2
have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS
2
single crystalline films, which has not yet been achieved. In this work, for the first time, we demonstrate the epitaxial growth of high quality large-area uniform ZrS
2
films on
c
-plane sapphire substrates by chemical vapor deposition. An atomically sharp interface is observed due to the supercell matching between ZrS
2
and sapphire, and their epitaxial relationship is found to be ZrS
2
(0001)[101̄0]∥Al
2
O
3
(0001)[112̄0]. The epitaxial ZrS
2
film exhibits n-type semiconductor behavior with a room temperature mobility of 2.4 cm
2
·V
−1
·s
−1
, and the optical phonon is the dominant scattering mechanism at room temperature or above. Furthermore, the optoelectronic applications of ZrS
2
films are demonstrated by fabricating photodetector devices. The ZrS
2
photodetectors exhibit the excellent comprehensive performance, such as a light on/off ratio of 10
6
and a specific detectivity of 2.6 × 10
12
Jones, which are the highest values compared with the photodetectors based on other group-IVB two-dimensional TMDs. |
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ISSN: | 1998-0124 1998-0000 |
DOI: | 10.1007/s12274-022-4308-4 |