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Epitaxial growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics
Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS 2 have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS 2...
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Published in: | Nano research 2022-07, Vol.15 (7), p.6628-6635 |
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container_title | Nano research |
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description | Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS
2
have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS
2
single crystalline films, which has not yet been achieved. In this work, for the first time, we demonstrate the epitaxial growth of high quality large-area uniform ZrS
2
films on
c
-plane sapphire substrates by chemical vapor deposition. An atomically sharp interface is observed due to the supercell matching between ZrS
2
and sapphire, and their epitaxial relationship is found to be ZrS
2
(0001)[101̄0]∥Al
2
O
3
(0001)[112̄0]. The epitaxial ZrS
2
film exhibits n-type semiconductor behavior with a room temperature mobility of 2.4 cm
2
·V
−1
·s
−1
, and the optical phonon is the dominant scattering mechanism at room temperature or above. Furthermore, the optoelectronic applications of ZrS
2
films are demonstrated by fabricating photodetector devices. The ZrS
2
photodetectors exhibit the excellent comprehensive performance, such as a light on/off ratio of 10
6
and a specific detectivity of 2.6 × 10
12
Jones, which are the highest values compared with the photodetectors based on other group-IVB two-dimensional TMDs. |
doi_str_mv | 10.1007/s12274-022-4308-4 |
format | article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_journals_2688285577</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2688285577</sourcerecordid><originalsourceid>FETCH-LOGICAL-c316t-d0f572fd509a3c988dfce80e501abece714320c058f731e005a5fce07db79c093</originalsourceid><addsrcrecordid>eNp1kE9PwzAMxSMEEmPwAbhF4lxw0mZJj2iMP9IkDsBllyhLna1T15SkFfDtyVQQJ3ywLeu9Z-lHyCWDawYgbyLjXBYZcJ4VOaisOCITVpYqg1THvzvjxSk5i3EHMOOsUBOyWnR1bz5r09BN8B_9lnpHGxM2SE1AQ1fhhVN-RyPua-vbarC9D9TVzT5S39Joum5bB6QuXX3Xe2zQ9sG3tY3n5MSZJuLFz5ySt_vF6_wxWz4_PM1vl5nN2azPKnBCclcJKE1uS6UqZ1EBCmBmjRYlK3IOFoRyMmcIIIxICpDVWpYWynxKrsbcLvj3AWOvd34IbXqp-UwproSQMqnYqLLBxxjQ6S7UexO-NAN9QKhHhDoh1AeEqU0JHz0xadsNhr_k_03fF_10LQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2688285577</pqid></control><display><type>article</type><title>Epitaxial growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics</title><source>Springer Nature:Jisc Collections:Springer Nature Read and Publish 2023-2025: Springer Reading List</source><creator>Tian, Yan ; Cheng, Yong ; Huang, Jidong ; Zhang, Siyu ; Dong, Hao ; Wang, Gaokai ; Chen, Jingren ; Wu, Jinliang ; Yin, Zhigang ; Zhang, Xingwang</creator><creatorcontrib>Tian, Yan ; Cheng, Yong ; Huang, Jidong ; Zhang, Siyu ; Dong, Hao ; Wang, Gaokai ; Chen, Jingren ; Wu, Jinliang ; Yin, Zhigang ; Zhang, Xingwang</creatorcontrib><description>Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS
2
have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS
2
single crystalline films, which has not yet been achieved. In this work, for the first time, we demonstrate the epitaxial growth of high quality large-area uniform ZrS
2
films on
c
-plane sapphire substrates by chemical vapor deposition. An atomically sharp interface is observed due to the supercell matching between ZrS
2
and sapphire, and their epitaxial relationship is found to be ZrS
2
(0001)[101̄0]∥Al
2
O
3
(0001)[112̄0]. The epitaxial ZrS
2
film exhibits n-type semiconductor behavior with a room temperature mobility of 2.4 cm
2
·V
−1
·s
−1
, and the optical phonon is the dominant scattering mechanism at room temperature or above. Furthermore, the optoelectronic applications of ZrS
2
films are demonstrated by fabricating photodetector devices. The ZrS
2
photodetectors exhibit the excellent comprehensive performance, such as a light on/off ratio of 10
6
and a specific detectivity of 2.6 × 10
12
Jones, which are the highest values compared with the photodetectors based on other group-IVB two-dimensional TMDs.</description><identifier>ISSN: 1998-0124</identifier><identifier>EISSN: 1998-0000</identifier><identifier>DOI: 10.1007/s12274-022-4308-4</identifier><language>eng</language><publisher>Beijing: Tsinghua University Press</publisher><subject>Aluminum oxide ; Atomic/Molecular Structure and Spectra ; Biomedicine ; Biotechnology ; Chemical vapor deposition ; Chemistry and Materials Science ; Condensed Matter Physics ; Epitaxial growth ; Materials Science ; N-type semiconductors ; Nanotechnology ; Optoelectronic devices ; Optoelectronics ; Photometers ; Physical properties ; Research Article ; Room temperature ; Sapphire ; Semiconductors ; Substrates ; Thin films ; Transition metal compounds ; Zirconium</subject><ispartof>Nano research, 2022-07, Vol.15 (7), p.6628-6635</ispartof><rights>Tsinghua University Press 2022</rights><rights>Tsinghua University Press 2022.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c316t-d0f572fd509a3c988dfce80e501abece714320c058f731e005a5fce07db79c093</citedby><cites>FETCH-LOGICAL-c316t-d0f572fd509a3c988dfce80e501abece714320c058f731e005a5fce07db79c093</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27922,27923</link.rule.ids></links><search><creatorcontrib>Tian, Yan</creatorcontrib><creatorcontrib>Cheng, Yong</creatorcontrib><creatorcontrib>Huang, Jidong</creatorcontrib><creatorcontrib>Zhang, Siyu</creatorcontrib><creatorcontrib>Dong, Hao</creatorcontrib><creatorcontrib>Wang, Gaokai</creatorcontrib><creatorcontrib>Chen, Jingren</creatorcontrib><creatorcontrib>Wu, Jinliang</creatorcontrib><creatorcontrib>Yin, Zhigang</creatorcontrib><creatorcontrib>Zhang, Xingwang</creatorcontrib><title>Epitaxial growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics</title><title>Nano research</title><addtitle>Nano Res</addtitle><description>Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS
2
have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS
2
single crystalline films, which has not yet been achieved. In this work, for the first time, we demonstrate the epitaxial growth of high quality large-area uniform ZrS
2
films on
c
-plane sapphire substrates by chemical vapor deposition. An atomically sharp interface is observed due to the supercell matching between ZrS
2
and sapphire, and their epitaxial relationship is found to be ZrS
2
(0001)[101̄0]∥Al
2
O
3
(0001)[112̄0]. The epitaxial ZrS
2
film exhibits n-type semiconductor behavior with a room temperature mobility of 2.4 cm
2
·V
−1
·s
−1
, and the optical phonon is the dominant scattering mechanism at room temperature or above. Furthermore, the optoelectronic applications of ZrS
2
films are demonstrated by fabricating photodetector devices. The ZrS
2
photodetectors exhibit the excellent comprehensive performance, such as a light on/off ratio of 10
6
and a specific detectivity of 2.6 × 10
12
Jones, which are the highest values compared with the photodetectors based on other group-IVB two-dimensional TMDs.</description><subject>Aluminum oxide</subject><subject>Atomic/Molecular Structure and Spectra</subject><subject>Biomedicine</subject><subject>Biotechnology</subject><subject>Chemical vapor deposition</subject><subject>Chemistry and Materials Science</subject><subject>Condensed Matter Physics</subject><subject>Epitaxial growth</subject><subject>Materials Science</subject><subject>N-type semiconductors</subject><subject>Nanotechnology</subject><subject>Optoelectronic devices</subject><subject>Optoelectronics</subject><subject>Photometers</subject><subject>Physical properties</subject><subject>Research Article</subject><subject>Room temperature</subject><subject>Sapphire</subject><subject>Semiconductors</subject><subject>Substrates</subject><subject>Thin films</subject><subject>Transition metal compounds</subject><subject>Zirconium</subject><issn>1998-0124</issn><issn>1998-0000</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2022</creationdate><recordtype>article</recordtype><recordid>eNp1kE9PwzAMxSMEEmPwAbhF4lxw0mZJj2iMP9IkDsBllyhLna1T15SkFfDtyVQQJ3ywLeu9Z-lHyCWDawYgbyLjXBYZcJ4VOaisOCITVpYqg1THvzvjxSk5i3EHMOOsUBOyWnR1bz5r09BN8B_9lnpHGxM2SE1AQ1fhhVN-RyPua-vbarC9D9TVzT5S39Joum5bB6QuXX3Xe2zQ9sG3tY3n5MSZJuLFz5ySt_vF6_wxWz4_PM1vl5nN2azPKnBCclcJKE1uS6UqZ1EBCmBmjRYlK3IOFoRyMmcIIIxICpDVWpYWynxKrsbcLvj3AWOvd34IbXqp-UwproSQMqnYqLLBxxjQ6S7UexO-NAN9QKhHhDoh1AeEqU0JHz0xadsNhr_k_03fF_10LQ</recordid><startdate>20220701</startdate><enddate>20220701</enddate><creator>Tian, Yan</creator><creator>Cheng, Yong</creator><creator>Huang, Jidong</creator><creator>Zhang, Siyu</creator><creator>Dong, Hao</creator><creator>Wang, Gaokai</creator><creator>Chen, Jingren</creator><creator>Wu, Jinliang</creator><creator>Yin, Zhigang</creator><creator>Zhang, 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growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics</title><author>Tian, Yan ; Cheng, Yong ; Huang, Jidong ; Zhang, Siyu ; Dong, Hao ; Wang, Gaokai ; Chen, Jingren ; Wu, Jinliang ; Yin, Zhigang ; Zhang, Xingwang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c316t-d0f572fd509a3c988dfce80e501abece714320c058f731e005a5fce07db79c093</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2022</creationdate><topic>Aluminum oxide</topic><topic>Atomic/Molecular Structure and Spectra</topic><topic>Biomedicine</topic><topic>Biotechnology</topic><topic>Chemical vapor deposition</topic><topic>Chemistry and Materials Science</topic><topic>Condensed Matter Physics</topic><topic>Epitaxial growth</topic><topic>Materials Science</topic><topic>N-type semiconductors</topic><topic>Nanotechnology</topic><topic>Optoelectronic devices</topic><topic>Optoelectronics</topic><topic>Photometers</topic><topic>Physical properties</topic><topic>Research Article</topic><topic>Room temperature</topic><topic>Sapphire</topic><topic>Semiconductors</topic><topic>Substrates</topic><topic>Thin films</topic><topic>Transition metal compounds</topic><topic>Zirconium</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Tian, Yan</creatorcontrib><creatorcontrib>Cheng, Yong</creatorcontrib><creatorcontrib>Huang, Jidong</creatorcontrib><creatorcontrib>Zhang, Siyu</creatorcontrib><creatorcontrib>Dong, Hao</creatorcontrib><creatorcontrib>Wang, Gaokai</creatorcontrib><creatorcontrib>Chen, Jingren</creatorcontrib><creatorcontrib>Wu, Jinliang</creatorcontrib><creatorcontrib>Yin, Zhigang</creatorcontrib><creatorcontrib>Zhang, Xingwang</creatorcontrib><collection>CrossRef</collection><collection>ProQuest Central (Corporate)</collection><collection>Aluminium Industry 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Xingwang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Epitaxial growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics</atitle><jtitle>Nano research</jtitle><stitle>Nano Res</stitle><date>2022-07-01</date><risdate>2022</risdate><volume>15</volume><issue>7</issue><spage>6628</spage><epage>6635</epage><pages>6628-6635</pages><issn>1998-0124</issn><eissn>1998-0000</eissn><abstract>Recently, group-IVB semiconducting transition metal dichalcogenides (TMDs) of ZrS
2
have attracted significant research interest due to its layered nature, moderate band gap, and extraordinary physical properties. Most device applications require a deposition of high quality large-area uniform ZrS
2
single crystalline films, which has not yet been achieved. In this work, for the first time, we demonstrate the epitaxial growth of high quality large-area uniform ZrS
2
films on
c
-plane sapphire substrates by chemical vapor deposition. An atomically sharp interface is observed due to the supercell matching between ZrS
2
and sapphire, and their epitaxial relationship is found to be ZrS
2
(0001)[101̄0]∥Al
2
O
3
(0001)[112̄0]. The epitaxial ZrS
2
film exhibits n-type semiconductor behavior with a room temperature mobility of 2.4 cm
2
·V
−1
·s
−1
, and the optical phonon is the dominant scattering mechanism at room temperature or above. Furthermore, the optoelectronic applications of ZrS
2
films are demonstrated by fabricating photodetector devices. The ZrS
2
photodetectors exhibit the excellent comprehensive performance, such as a light on/off ratio of 10
6
and a specific detectivity of 2.6 × 10
12
Jones, which are the highest values compared with the photodetectors based on other group-IVB two-dimensional TMDs.</abstract><cop>Beijing</cop><pub>Tsinghua University Press</pub><doi>10.1007/s12274-022-4308-4</doi><tpages>8</tpages></addata></record> |
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issn | 1998-0124 1998-0000 |
language | eng |
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source | Springer Nature:Jisc Collections:Springer Nature Read and Publish 2023-2025: Springer Reading List |
subjects | Aluminum oxide Atomic/Molecular Structure and Spectra Biomedicine Biotechnology Chemical vapor deposition Chemistry and Materials Science Condensed Matter Physics Epitaxial growth Materials Science N-type semiconductors Nanotechnology Optoelectronic devices Optoelectronics Photometers Physical properties Research Article Room temperature Sapphire Semiconductors Substrates Thin films Transition metal compounds Zirconium |
title | Epitaxial growth of large area ZrS2 2D semiconductor films on sapphire for optoelectronics |
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