Ordered Silica Nanostructure by the Calcination of Block Copolymer with Polyhedral Oligomeric Silsesquioxane (POSS) Side Chain

Silica with well-ordered line patterns and a periodicity of approximately 30 nm was prepared by the calcination of a block copolymer with polyhedral oligomeric silsesquioxane (POSS) as a template. A POSS-containing block copolymer was prepared via living anionic polymerization. The thin film of the...

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Bibliographic Details
Published in:Chemistry letters 2022-07, Vol.51 (7), p.781-783
Main Authors: Iwao, Sota, Kurono, Naoki, Higashiguchi, Wataru, Hayakawa, Teruaki, Ohta, Noboru, Kamitani, Kazutaka, Fujii, Syuji, Nakamura, Yoshinobu, Hirai, Tomoyasu
Format: Article
Language:English
Subjects:
Anionic polymerization
Block copolymers
Polyhedral oligomeric silsesquioxane
Roasting
Silicon dioxide
Thin films
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Summary:Silica with well-ordered line patterns and a periodicity of approximately 30 nm was prepared by the calcination of a block copolymer with polyhedral oligomeric silsesquioxane (POSS) as a template. A POSS-containing block copolymer was prepared via living anionic polymerization. The thin film of the block copolymer exhibited linear features upon CS2 vapor annealing. Cylindrical structure changed to a line morphology during calcination process.
ISSN:0366-7022
1348-0715
DOI:10.1246/cl.220180