High-Performance Large-Scale Atomistic Simulation of Thin Films Deposition

The high-performance molecular dynamics simulation of the ion-assisted deposition of thin films is performed. The most time-consuming computational procedures are discussed. The structural parameters of the deposited films, depending on the deposition conditions, are calculated and verified using ex...

Full description

Saved in:
Bibliographic Details
Published in:Lobachevskii journal of mathematics 2022-04, Vol.43 (4), p.857-863
Main Authors: Grigoriev, F. V., Sulimov, V. B., Tikhonravov, A. V.
Format: Article
Language:English
Subjects:
Algebra
Analysis
Geometry
Ion beam assisted deposition
Mathematical Logic and Foundations
Mathematics
Mathematics and Statistics
Molecular dynamics
Probability Theory and Stochastic Processes
Thin films
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The high-performance molecular dynamics simulation of the ion-assisted deposition of thin films is performed. The most time-consuming computational procedures are discussed. The structural parameters of the deposited films, depending on the deposition conditions, are calculated and verified using experimental data.
ISSN:1995-0802
1818-9962
DOI:10.1134/S1995080222070137