Toward robust models for predicting carbon dioxide absorption by nanofluids

The application of nanofluids has received increased attention across a number of disciplines in recent years. Carbon dioxide (CO2) absorption by using nanofluids as the solvents for the capture of CO2 is among the attractive applications, which have recently gained high popularity in various indust...

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Bibliographic Details
Published in:Greenhouse gases: science and technology 2022-08, Vol.12 (4), p.537-551
Main Authors: Nait Amar, Menad, Djema, Hakim, Belhaouari, Samir Brahim, Zeraibi, Noureddine
Format: Article
Language:English
Subjects:
Absorption
Carbon dioxide
Genetic algorithms
genetic programming
Group method of data handling
Machine learning
Nanofluids
Robustness
Trend analysis
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Summary:The application of nanofluids has received increased attention across a number of disciplines in recent years. Carbon dioxide (CO2) absorption by using nanofluids as the solvents for the capture of CO2 is among the attractive applications, which have recently gained high popularity in various industrial aspects. In this work, two robust explicit‐based machine learning (ML) methods, namely group method of data handling (GMDH) and genetic programming (GP) were implemented for establishing accurate correlations that can estimate the absorption of CO2 by nanofluids. The correlations were developed using a comprehensive database that involved 230 experimental measurements. The obtained results revealed that the proposed ML‐based correlations can predict the absorption of CO2 by nanofluids with high accuracy. Besides, it was found that the GP‐based correlation yielded more precise predictions compared to the GMDH‐based correlation. The GP‐based correlation has an overall coefficient of determination of 0.9914 and an overall average absolute relative deviation of 3.732%. Lastly, the carried‐out trend analysis confirmed the compatibility of the proposed GP‐based correlation with the real physical tendency of CO2 absorption by nanofluids. © 2022 Society of Chemical Industry and John Wiley & Sons, Ltd.
ISSN:2152-3878
2152-3878
DOI:10.1002/ghg.2166