Effects of Sintering Temperature on MoOx Target and Film

The sintering process of the MoOx target has an impact on the quality of the sputtered film. In this study, powders of MoO3 (78 wt%) and MoO2 (22 wt%) were milled and hot-pressed to prepare the MoOx target. The effects of the sintering temperature of the MoOx targets on the properties of the sputter...

Full description

Saved in:
Bibliographic Details
Published in:Coatings (Basel) 2022-11, Vol.12 (11), p.1624
Main Authors: Zhou, Xianjie, Xiong, Hanqing, Xu, Jiwen
Format: Article
Language:English
Subjects:
Crystal structure
Crystallization
Electrodes
Molybdenum
Sinterability
Sintering
Sintering (powder metallurgy)
Temperature
Thickness
Thin films
Transmissivity
Citations: Items that this one cites
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The sintering process of the MoOx target has an impact on the quality of the sputtered film. In this study, powders of MoO3 (78 wt%) and MoO2 (22 wt%) were milled and hot-pressed to prepare the MoOx target. The effects of the sintering temperature of the MoOx targets on the properties of the sputtered MoOx films were investigated by X-ray diffraction, scanning electron microscopy, four-probe needle, and spectrophotometer tests. The research results revealed that the MoOx target at the sintered temperature of 1000 °C had a clear crystal structure and dense grains, exhibiting good sinterability, crystallization behavior, and film-forming property. The sputtered film deposited by the MoOx target could obtain high quality with a smooth interface and uniform thickness. The film had smaller resistivity, higher reflectivity, and appropriate transmissivity compared to the ones fabricated by other targets that were sintered at 800 °C, 900 °C, and 1100 °C.
ISSN:2079-6412
2079-6412
DOI:10.3390/coatings12111624