Effect of the optimal annealing time on enhanced magnetic properties of Fe3O4 films

The magnetic hybrid structure of a half-metallic ferromagnetic oxide and a non-magnetic oxide is promising for future spintronic devices. However, the ferromagnetic layer’s structural and magnetic characterizations must be improved urgently. Here, we report on the effect of annealing time on enhanci...

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Bibliographic Details
Published in:Journal of the Ceramic Society of Japan 2022/12/01, Vol.130(12), pp.948-951
Main Authors: Pham, Thi Kim Hang, Truong, Vo Doan Thanh, Le, Van-Qui
Format: Article
Language:eng ; jpn
Subjects:
Annealing
Ferromagnetic materials
Hybrid structures
Iron oxides
Magnetic properties
Magnetite
Magnetization
Magnetometers
Magnetron sputtering
Multilayers
RF-magnetron sputtering
Room temperature
Silicon dioxide
Spintronic
Spintronics
Structural analysis
Thin films
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Summary:The magnetic hybrid structure of a half-metallic ferromagnetic oxide and a non-magnetic oxide is promising for future spintronic devices. However, the ferromagnetic layer’s structural and magnetic characterizations must be improved urgently. Here, we report on the effect of annealing time on enhancing the structural and magnetic properties of Fe3O4 films. Radio-frequency magnetron sputtering was used to fabricate Fe3O4 thin films on a multilayer of MgO/Ta/SiO2 at room temperature. As-grown Fe3O4 samples were annealed at the optimal temperature for various times. The structural and magnetic properties of Fe3O4 were observed by using atomic force microscopy, X-ray diffraction, and a vibrating sample magnetometer. The structural characterization of Fe3O4 thin films is significantly enhanced when increasing the annealing time. Moreover, the magnetization of Fe3O4 thin films is also highly improved compared to the bulk value. Our finding provides a highlight for the next generation of spintronics.
ISSN:1882-0743
1348-6535
DOI:10.2109/jcersj2.22099