Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma

In this study, the uniformity of a photoresist ashing for a half-inch wafer was improved by a developed antenna structure, a double U-shaped antenna, in microwave-excited water vapor plasma. The optimized double U-shaped antenna structure, obtained by simulating an electric field, generated a spread...

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Bibliographic Details
Published in:Journal of photopolymer science and technology 2021-09, Vol.34 (5)
Main Authors: Aizawa, Takeshi, Shimada, Taishin, Sakurai, Tasuku, Nakano, Yusuke, Tanaka, Yasunori, Uesugi, Yoshihiko, Ishijima, Tatsuo
Format: Article
Language:eng ; jpn
Subjects:
Electric fields
Microwave plasmas
Photoresists
Slot antennas
Water vapor
Online Access:Get full text
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Summary:In this study, the uniformity of a photoresist ashing for a half-inch wafer was improved by a developed antenna structure, a double U-shaped antenna, in microwave-excited water vapor plasma. The optimized double U-shaped antenna structure, obtained by simulating an electric field, generated a spread distribution microwave plasma. Experimentally obtained results demonstrate that the observed optical emission distribution image from the microwave plasma resembles the electric field distribution obtained from the simulation under the present water vapor plasma generation condition. The double U-shaped antenna showed a higher ashing rate and better uniformity than the conventional slot antenna.
ISSN:0914-9244
1349-6336
DOI:10.2494/photopolymer.34.479