Substrate engineering for wafer-scale two-dimensional material growth: strategies, mechanisms, and perspectives

The fabrication of wafer-scale two-dimensional (2D) materials is a prerequisite and important step for their industrial applications. Chemical vapor deposition (CVD) is the most promising approach to produce high-quality films in a scalable way. Recent breakthroughs in the epitaxy of wafer-scale sin...

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Bibliographic Details
Published in:Chemical Society reviews 2023-03, Vol.52 (5), p.165-1671
Main Authors: Zhao, Tiange, Guo, Jiaxiang, Li, Taotao, Wang, Zhen, Peng, Meng, Zhong, Fang, Chen, Yue, Yu, Yiye, Xu, Tengfei, Xie, Runzhang, Gao, Pingqi, Wang, Xinran, Hu, Weida
Format: Article
Language:English
Subjects:
Boron nitride
Chemical vapor deposition
Graphene
Industrial applications
Single crystals
Substrates
Transition metal compounds
Two dimensional materials
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Summary:The fabrication of wafer-scale two-dimensional (2D) materials is a prerequisite and important step for their industrial applications. Chemical vapor deposition (CVD) is the most promising approach to produce high-quality films in a scalable way. Recent breakthroughs in the epitaxy of wafer-scale single-crystalline graphene, hexagonal boron nitride, and transition-metal dichalcogenides highlight the pivotal roles of substrate engineering by lattice orientation, surface steps, and energy considerations. This review focuses on the existing strategies and underlying mechanisms, and discusses future directions in epitaxial substrate engineering to deliver wafer-scale 2D materials for integrated electronics and photonics. This review focuses on the existing strategies and underlying mechanisms, and discusses future directions in epitaxial substrate engineering to deliver wafer-scale 2D materials for integrated electronics and photonics.
ISSN:0306-0012
1460-4744
DOI:10.1039/d2cs00657j