DEFINING THE GEOMETRIC CONFIGURATIONS IN THIN FILMS

The paper gives a synthetic description of the lithography processes used to define geometric configurations in the technology of structures with thin films for MEMS applications. There are presented, also, performances of these technological procedures, some results of the work' authors and pr...

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Bibliographic Details
Published in:International Journal of Mechatronics & Applied Mechanics 2022-11, Vol.I (12), p.140-147
Main Authors: Ionascu, Georgeta, Bogatu, Lucian, Manea, Elena, Moraru, Edgar
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Configurations
Plasma etching
Radiation
Silicon wafers
Thin films
X-rays
Online Access:Get full text
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Summary:The paper gives a synthetic description of the lithography processes used to define geometric configurations in the technology of structures with thin films for MEMS applications. There are presented, also, performances of these technological procedures, some results of the work' authors and progress trends in this field.
ISSN:2559-4397
2559-6497
DOI:10.17683/ijomam/issue12.21