Holographic ultraviolet nanosecond laser processing using adaptive optics

Fabrication of a through hole in a polyimide film (PI) was demonstrated by holographic ultraviolet (UV) nanosecond laser processing with a computer-generated hologram displayed on a phase-only spatial light modulator (SLM). The UV laser was directly modulated into a Bessel beam by a diffractive axic...

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Bibliographic Details
Published in:Applied physics. B, Lasers and optics Lasers and optics, 2023-04, Vol.129 (4), Article 52
Main Authors: Hasegawa, Satoshi, Kato, Mizuki, Hayasaki, Yoshio
Format: Article
Language:English
Subjects:
Aberration
Ablation
Adaptive optics
Applied physics
Engineering
Gaussian beams (optics)
Harmonic generations
Holography
Laser processing
Lasers
Nonlinear optics
Optical Devices
Optics
Photonics
Physical Chemistry
Physics
Physics and Astronomy
Quantum Optics
Spatial light modulators
Ultraviolet lasers
Ultraviolet radiation
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Summary:Fabrication of a through hole in a polyimide film (PI) was demonstrated by holographic ultraviolet (UV) nanosecond laser processing with a computer-generated hologram displayed on a phase-only spatial light modulator (SLM). The UV laser was directly modulated into a Bessel beam by a diffractive axicon displayed on the SLM. The direct modulation contributed to improved light-utilization efficiency of the UV laser and a simplified optical setup compared to the conventional method based on a combination of an SLM and harmonic generation using a nonlinear optical crystal. The Bessel beam reduced the number of pulse shots required for through-hole fabrication to 1/5 compared to the Gaussian beam near the ablation threshold energy of the PI film. Furthermore, adaptive optics was implemented in holographic laser processing to compensate for aberrations in the optical setup. The aberration was reduced to 1/5 compared with before the compensation. The proposed method is suitable for improving the throughput and accuracy of drilling, cutting, and additive manufacturing using UV lasers with industrial requirements.
ISSN:0946-2171
1432-0649
DOI:10.1007/s00340-023-07993-1