Direct-write projection lithography of quantum dot micropillar single photon sources

We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve high volume patterning of high aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 \(\mu\)m. Enc...

Full description

Saved in:
Bibliographic Details
Published in:arXiv.org 2023-03
Main Authors: Androvitsaneas, Petros, Clark, Rachel N, Jordan, Matthew, Peach, Tomas, Thomas, Stuart, Saleem Shabbir, Sobiesierski, Angela D, Trapalis, Aristotelis, Farrer, Ian A, Langbein, Wolfgang W, Bennett, Anthony J
Format: Article
Language:English
Subjects:
High aspect ratio
Holes
Lithography
Optical properties
Oxidation
Photons
Quantum dots
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:We have developed a process to mass-produce quantum dot micropillar cavities using direct-write lithography. This technique allows us to achieve high volume patterning of high aspect ratio pillars with vertical, smooth sidewalls maintaining a high quality factor for diameters below 2.0 \(\mu\)m. Encapsulating the cavities in a thin layer of oxide (Ta\(_2\)O\(_5\)) prevents oxidation in the atmosphere, preserving the optical properties of the cavity over months of ambient exposure. We confirm that single dots in the cavities can be deterministically excited to create high purity indistinguishable single photons with interference visibility \((96.2\pm0.7)\%\).
ISSN:2331-8422
DOI:10.48550/arxiv.2304.00141