Effect of Low-Energy Ion Bombardment on the Texture and Microstructure of Platinum Films

• Published in: Surface investigation, x-ray, synchrotron and neutron techniques x-ray, synchrotron and neutron techniques, 2023-02, Vol.17 (1), p.180-186
• Main Authors: Selyukov, R. V., Naumov, V. V., Izyumov, M. O., Vasilev, S. V., Mazaletskiy, L. A.
• Format: Article
• Language: English
• Subjects: Argon plasma; Chemistry and Materials Science; Electric potential; Ion bombardment; Ion current density; Materials Science; Parameters; Platinum; Radiation damage; Room temperature; Surfaces and Interfaces; Texture; Thick films; Thin Films; Voltage
• ISSN: 1027-4510; 1819-7094
• DOI: 10.1134/S1027451023010366

We study the effect of low-energy ion bombardment on the texture and structure of an 80-nm-thick platinum film deposited at room temperature. The film is treated in an inductively coupled Ar plasma with a negative voltage of 45–125 V applied to the samples and an ion-current density of 3.3 mA/cm 2 . A series of treatments at each voltage results in thinning of the film; after each treatment, its structural parameters are determined by X-ray diffraction analysis and compared with the parameters of Pt films 20–60 nm thick deposited under the same conditions. The treatment at 75–125 V decreases the average size of the coherently diffracting domains by 10–25%; at 45 V, such a decrease is not observed. The results are explained by the formation and accumulation of radiation defects; the rate of their formation is lower at 45 V. Film sputtering in all modes does not worsen the sharpness of the film texture.