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Low-Frequency and Random Telegraph Noise in 14-nm Bulk Si Charge-Trap Transistors

Effects of programming/erasing (P/E) and total-ionizing dose (TID) are investigated on 2-and 40-fin charge-trap transistors (CTTs) fabricated in a 14-nm bulk-Si CMOS technology. Significant random telegraph noise (RTN) is observed in as-processed CTTs, especially for 2-fin devices. Trapped charge in...

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Bibliographic Details
Published in:IEEE transactions on electron devices 2023-06, Vol.70 (6), p.1-8
Main Authors: Gorchichko, Mariia, Zhang, En Xia, Reaz, Mahmud, Li, Kan, Wang, Peng Fei, Cao, Jingchen, Brewer, Rachel M., Schrimpf, Ronald D., Reed, Robert A., Sierawski, Brian D., Alles, Michael L., Cox, Jonathan, Moran, Steven L., Iyer, Subramanian S., Fleetwood, Daniel M.
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Language:English
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Summary:Effects of programming/erasing (P/E) and total-ionizing dose (TID) are investigated on 2-and 40-fin charge-trap transistors (CTTs) fabricated in a 14-nm bulk-Si CMOS technology. Significant random telegraph noise (RTN) is observed in as-processed CTTs, especially for 2-fin devices. Trapped charge in programed devices does not significantly affect 1/ \textit{f} noise magnitudes, but P/E leads to trap activation/deactivation, causing changes in border-trap energy and spatial distributions. TID irradiation activates a large number of stable radiation-induced traps.
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2023.3265939