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Low-Frequency and Random Telegraph Noise in 14-nm Bulk Si Charge-Trap Transistors
Effects of programming/erasing (P/E) and total-ionizing dose (TID) are investigated on 2-and 40-fin charge-trap transistors (CTTs) fabricated in a 14-nm bulk-Si CMOS technology. Significant random telegraph noise (RTN) is observed in as-processed CTTs, especially for 2-fin devices. Trapped charge in...
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Published in: | IEEE transactions on electron devices 2023-06, Vol.70 (6), p.1-8 |
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Main Authors: | , , , , , , , , , , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | Effects of programming/erasing (P/E) and total-ionizing dose (TID) are investigated on 2-and 40-fin charge-trap transistors (CTTs) fabricated in a 14-nm bulk-Si CMOS technology. Significant random telegraph noise (RTN) is observed in as-processed CTTs, especially for 2-fin devices. Trapped charge in programed devices does not significantly affect 1/ \textit{f} noise magnitudes, but P/E leads to trap activation/deactivation, causing changes in border-trap energy and spatial distributions. TID irradiation activates a large number of stable radiation-induced traps. |
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ISSN: | 0018-9383 1557-9646 |
DOI: | 10.1109/TED.2023.3265939 |