A Novel Pd Precursor Loaded γ‐Al2O3 with Excellent Adsorbent Performance for Ultra‐Deep Adsorptive Desulfurization of Benzene

• Published in: Advanced functional materials 2023-06, Vol.33 (25), p.n/a
• Main Authors: Xie, Jiyang, Ng, Kelvin, Dai, Yunsheng, Jiang, Jinke, Yu, Juan, Gao, Anli, Wang, Hongqin, Huang, Xinyu, Liu, Weiping, Guo, Shuailong
• Format: Article
• Language: English
• Subjects: Adsorbents; Adsorption; Adsorptivity; Aluminum oxide; Benzene; Chlorine; Desulfurizing; Hydrocarbons; Industrial applications; Materials science; Nitrogen dioxide; Palladium; Pd precursors; Pd sub‐nanoclusters; Precursors; Sulfur; thiophene; ultra‐deep desulfurization
• ISSN: 1616-301X; 1616-3028
• DOI: 10.1002/adfm.202213837

Fabricating highly water‐soluble and chlorine‐free precursors from Pd complexes remains challenging. Here, a novel Pd precursor (ammonium dinitrooxalato palladium(II) ((NH4)2[Pd(NO2)2(C2O4)]·2H2O)) is synthesized to address this challenge. Additionally, a Pd/Al2O3 adsorbent is prepared using γ‐Al2O3 as a base material to host Pd. The ligand action of the Pd complex forms single Pd atoms and Pd sub‐nano clusters on the surface of γ‐Al2O3. Pd/Al2O3‐4 as an adsorbent is evaluated using the benzene ultra‐deep desulfurization procedure, wherein thiophene is used as a probe molecule. The sulfur adsorption capacity of Pd/Al2O3‐4 is 1.76 mg g−1 for the ultra‐deep adsorptive desulfurization of benzene at a sulfur concentration of 50 ppm. The sulfur adsorption capacity of the new Pd/Al2O3‐4 adsorbent is 21.8% higher than that of a commercial Pd/Al2O3 adsorbent. In addition, the stability and durability of Pd/Al2O3‐4 are investigated at a sulfur concentration of 1 ppm. The Pd/Al2O3‐4 adsorbent achieves ≈100% thiophene removal after 434 h, which is 62 h more than the time required by the commercial Pd/Al2O3 adsorbent. The novel Pd precursor shows excellent potential for industrial applications, and the Pd/Al2O3‐4 adsorbent can be produced on a mass scale of 500 kg per batch. Ammonium dinitrooxalato palladium(II) ((NH4)2[Pd(NO2)2(C2O4)]·nH2O) is developed as a novel Pd precursor to acquire Pd load γ‐Al2O3 base adsorbent for use in the ultra‐deep adsorptive desulfurization process of benzene. The sulfur adsorption capacity of adsorbent presents superior functionality and durability. Especially, the novel adsorbent achieves mass production of 500 kg per batch.