PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well as mechanical engineering over the last years, mostly within...

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Published in:arXiv.org 2023-06
Main Authors: de los Arcos, Teresa, Awakowicz, Peter, Benedikt, Jan, Biskup, Beatrix, Böke, Marc, Boysen, Nils, Buschhaus, Rahel, Dahlmann, Rainer, Devi, Anjana, Gergs, Tobias, Jenderny, Jonathan, Achim von Keudell, Kühne, Thomas D, Kusmierz, Simon, Müller, Hendrik, Mussenbrock, Thomas, Trieschmann, Jan, Zanders, David, Zysk, Frederik, Grundmeier, Guido
Format: Article
Language:English
Subjects:
Chemical vapor deposition
Film growth
Mechanical engineering
Plasma physics
Polymers
Substrates
Thin films
Vapor phases
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Summary:This feature article considers the analysis of the initial states of film growth on polymer substrates. The assembled results are based on the cooperation between research groups in the field of plasma physics, chemistry, electric as well as mechanical engineering over the last years, mostly within the frame of the transregional project SFB-TR 87 ("Pulsed high power plasmas for the synthesis of nanostructured functional layers"). This feature article aims at bridging the gap between the understanding of plasma processes in the gas phase and the resulting surface and interface processes of the polymer. The results show that interfacial adhesion and initial film growth can be well controlled and even predicted based on the combination of analytical approaches.
ISSN:2331-8422