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Effect of hard segment chemistry and structure on the self‐healing properties of UV‐curable coatings based on the urethane acrylates with built‐in Diels–Alder adduct
The development of new photoreactive resins to obtain smart coatings and enhance the self‐healing (SH) properties of photoreactive resins has attracted great interest in the past few years, and the investigation of the relationship between phase structure and smart properties is necessary. Herein, f...
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Published in: | Journal of applied polymer science 2023-08, Vol.140 (32), p.n/a |
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Main Authors: | , , , , , |
Format: | Article |
Language: | English |
Subjects: | |
Citations: | Items that this one cites Items that cite this one |
Online Access: | Get full text |
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Summary: | The development of new photoreactive resins to obtain smart coatings and enhance the self‐healing (SH) properties of photoreactive resins has attracted great interest in the past few years, and the investigation of the relationship between phase structure and smart properties is necessary. Herein, four types of urethane acrylate resins with built‐in DA structures with different hard segment structures, and a slight change in the length of the polyol soft segment were prepared. The hard segments were made of hexamethylene diisocyanate (HDI) with a linear structure and isophorone diisocyanate (IPDI) with an alicyclic structure, and the soft segments consisted of polyethylene glycols (PEG 400 and PEG 1000, respectively). The obtained resins were used to prepare polymer films that were cured using UV radiation. The coatings obtained in this way were tested for the influence of the polymer chain architecture on the kinetics of photopolymerization, the properties of the cured coatings, as well as the thermal characteristics and thermoreversibility performance of the cured coatings and their SH ability.
The process of photo‐curing, scratching and self‐healing of the coating based on the urethane acrylate oligomer with a built‐in Diels‐Alder adduct and a different structure of the hard segment. |
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ISSN: | 0021-8995 1097-4628 |
DOI: | 10.1002/app.54266 |