The Influence of Ion Implantation on Internal Stresses of a Submicrocrystalline VT1-0 Alloy

• Published in: Russian physics journal 2023-07, Vol.66 (3), p.279-289
• Main Authors: Nikonenko, A. V., Popova, N. A., Klopotov, A. A., Nikonenko, E. L., Potekaev, A. I., Borodin, V. I.
• Format: Article
• Language: English
• Subjects: Alloys; Aluminum; Condensed Matter Physics; Fine structure; Grain structure; Hadrons; Heavy Ions; Ion implantation; Lasers; Mathematical and Computational Physics; Nuclear Physics; Optical Devices; Optics; Photonics; Physics; Physics and Astronomy; Residual stress; Shear stress; Specialty metals industry; Theoretical; Titanium base alloys
• ISSN: 1064-8887; 1573-9228
• DOI: 10.1007/s11182-023-02937-w

The fine structure of a submicrocrystalline (SMC) VT1-0 alloy is studied after its implantation with aluminum ions at the irradiation doses of 1·10 17 , 5·10 17 , and 10·10 17 ion/cm 2 . A gradient structure is observed to form in the alloy in this state, which consists of five different layers: 1 – oxide layer, 2 – ion-doped layer, 3 – layer with refined grain structure, 4 – layer of residual implantation influence, 5 – layer with initial grain structure. It is shown that at all of the implantation doses used in the study there is no dislocation structure in layers 2 and 3, and the dislocations in layers 4 and 5 form a network substructure. The internal stresses in layers 2 and 3 represent an elastic component of long-range stresses, in layer 4 – long-range and shear stresses, and in layer 5 – shear stresses only.